Simulation of formation of an intensive electron beam in bipolar electron-optical system with the plasma anode
The algorithm of numerical simulation of electrons sources in base of the high-voltage glow discharge with the anode plasma, taking into account change of the form and the location of a surface of anode plasma, that renders essential influence on formation of an ion stream, which at hit on the cold...
Збережено в:
| Дата: | 2002 |
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| Автори: | , , |
| Формат: | Стаття |
| Мова: | English |
| Опубліковано: |
Національний науковий центр «Харківський фізико-технічний інститут» НАН України
2002
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| Назва видання: | Вопросы атомной науки и техники |
| Теми: | |
| Онлайн доступ: | http://dspace.nbuv.gov.ua/handle/123456789/79283 |
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| Назва журналу: | Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| Цитувати: | Simulation of formation of an intensive electron beam in bipolar electron-optical system with the plasma anode / A.F. Stekolnikov, V.A. Gruzdev, O.N. Petrovich // Вопросы атомной науки и техники. — 2002. — № 5. — С. 113-114. — Бібліогр.: 2 назв. — англ. |
Репозитарії
Digital Library of Periodicals of National Academy of Sciences of Ukraine| id |
irk-123456789-79283 |
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| record_format |
dspace |
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irk-123456789-792832015-03-31T03:02:16Z Simulation of formation of an intensive electron beam in bipolar electron-optical system with the plasma anode Stekolnikov, A.F. Gruzdev, V.A. Petrovich, O.N. Plasma electronics The algorithm of numerical simulation of electrons sources in base of the high-voltage glow discharge with the anode plasma, taking into account change of the form and the location of a surface of anode plasma, that renders essential influence on formation of an ion stream, which at hit on the cold cathode as a result of secondary ion - electronic emission forms an electron beam, is offered. As against other algorithms the offered physics-mathematical model takes into account influence on distribution of potential not only an ion space charge, but also a space charge of beam electrons, distribution of potential in turn defines as a trajectory the beam electrons and a stream of ions, and position of plasma edge which movement is considered during formation of a beam according to Stefan's condition. 2002 Article Simulation of formation of an intensive electron beam in bipolar electron-optical system with the plasma anode / A.F. Stekolnikov, V.A. Gruzdev, O.N. Petrovich // Вопросы атомной науки и техники. — 2002. — № 5. — С. 113-114. — Бібліогр.: 2 назв. — англ. 1562-6016 PACS: 52.65.-y http://dspace.nbuv.gov.ua/handle/123456789/79283 en Вопросы атомной науки и техники Національний науковий центр «Харківський фізико-технічний інститут» НАН України |
| institution |
Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| collection |
DSpace DC |
| language |
English |
| topic |
Plasma electronics Plasma electronics |
| spellingShingle |
Plasma electronics Plasma electronics Stekolnikov, A.F. Gruzdev, V.A. Petrovich, O.N. Simulation of formation of an intensive electron beam in bipolar electron-optical system with the plasma anode Вопросы атомной науки и техники |
| description |
The algorithm of numerical simulation of electrons sources in base of the high-voltage glow discharge with the anode plasma, taking into account change of the form and the location of a surface of anode plasma, that renders essential influence on formation of an ion stream, which at hit on the cold cathode as a result of secondary ion - electronic emission forms an electron beam, is offered. As against other algorithms the offered physics-mathematical model takes into account influence on distribution of potential not only an ion space charge, but also a space charge of beam electrons, distribution of potential in turn defines as a trajectory the beam electrons and a stream of ions, and position of plasma edge which movement is considered during formation of a beam according to Stefan's condition. |
| format |
Article |
| author |
Stekolnikov, A.F. Gruzdev, V.A. Petrovich, O.N. |
| author_facet |
Stekolnikov, A.F. Gruzdev, V.A. Petrovich, O.N. |
| author_sort |
Stekolnikov, A.F. |
| title |
Simulation of formation of an intensive electron beam in bipolar electron-optical system with the plasma anode |
| title_short |
Simulation of formation of an intensive electron beam in bipolar electron-optical system with the plasma anode |
| title_full |
Simulation of formation of an intensive electron beam in bipolar electron-optical system with the plasma anode |
| title_fullStr |
Simulation of formation of an intensive electron beam in bipolar electron-optical system with the plasma anode |
| title_full_unstemmed |
Simulation of formation of an intensive electron beam in bipolar electron-optical system with the plasma anode |
| title_sort |
simulation of formation of an intensive electron beam in bipolar electron-optical system with the plasma anode |
| publisher |
Національний науковий центр «Харківський фізико-технічний інститут» НАН України |
| publishDate |
2002 |
| topic_facet |
Plasma electronics |
| url |
http://dspace.nbuv.gov.ua/handle/123456789/79283 |
| citation_txt |
Simulation of formation of an intensive electron beam in bipolar electron-optical system with the plasma anode / A.F. Stekolnikov, V.A. Gruzdev, O.N. Petrovich // Вопросы атомной науки и техники. — 2002. — № 5. — С. 113-114. — Бібліогр.: 2 назв. — англ. |
| series |
Вопросы атомной науки и техники |
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2023-10-18T19:18:21Z |
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