Surface wave plasma source for broad-beam ion and electron production
The new type of multipurpose plasma source based on the surface wave sustained discharge is presented. The plasma in the source is generated by the RF surface wave discharge excited by the antenna system placed inside a cylindrical metal chamber. Charged particle acceleration is carried out by a q...
Збережено в:
| Дата: | 2004 |
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| Автори: | , , , , , , |
| Формат: | Стаття |
| Мова: | English |
| Опубліковано: |
Національний науковий центр «Харківський фізико-технічний інститут» НАН України
2004
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| Назва видання: | Вопросы атомной науки и техники |
| Теми: | |
| Онлайн доступ: | http://dspace.nbuv.gov.ua/handle/123456789/79361 |
| Теги: |
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| Назва журналу: | Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| Цитувати: | Surface wave plasma source for broad-beam ion and electron production / N.A. Azarenkov, A.A. Bizyukov, A.V. Gapon, V.P. Olefir, A.Y. Kashaba, K.N. Sereda, I.K. Tarasov // Вопросы атомной науки и техники. — 2004. — № 2. — С. 111-113. — Бібліогр.: 6 назв. — англ. |
Репозитарії
Digital Library of Periodicals of National Academy of Sciences of Ukraine| Резюме: | The new type of multipurpose plasma source based on the surface wave sustained discharge is presented. The
plasma in the source is generated by the RF surface wave discharge excited by the antenna system placed inside a
cylindrical metal chamber. Charged particle acceleration is carried out by a quasi-stationary electric field due to DC
voltage applied to the cylindrical electrode mounted inside the chamber. The source can be used for production and
acceleration of ion as well as electron beams. The source has stable low-pressure operation in the range of applied
RF power from 50 to 1000 W and produce ion beam having a density up to 0.3 mA/cm2 in the energy range from 50
to 200 eV and 3% homogeneity on the 300 mm diameter. |
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