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Formation of thin film Cr-N composites under ion bombardment at low rates of chromium deposition

Formation of thin film Cr-N composites under ion bombardment at low rates of chromium deposition

One of peculiar features of the IBAD technology consists in that the damage level and concentration of implanted ions are distributed nonuniformly in the depth of deposited material. The calculations, we have done earlier [1], showed that the highest degree of nonequilibrium is realized in the first...

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Bibliographic Details
Main Authors: Guglya, A., Litvinenko, M., Marchenko, Y., Vasilenko, R.
Format: Article
Language:English
Published: Національний науковий центр «Харківський фізико-технічний інститут» НАН України 2006
Series:Вопросы атомной науки и техники
Subjects:
Физика радиационных и ионно-плазменных технологий
Online Access:http://dspace.nbuv.gov.ua/handle/123456789/80293
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http://dspace.nbuv.gov.ua/handle/123456789/80293

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