Ion kinetics in an ECR plasma source

Ion kinetics in an ECR plasma source

In plasma reactors it is extremely important the study for achieving greater control of critical parameters such as the flux velocities and the energy distribution of ions. These quantities are functions of the reactor physical dimensions, magnetic field profile as well as the kinetic chemical react...

Повний опис

Збережено в:
Бібліографічні деталі
Дата:2002
Автор: Gutiérrez-Tapia, C.
Формат: Стаття
Мова:English
Опубліковано: Національний науковий центр «Харківський фізико-технічний інститут» НАН України 2002
Назва видання:Вопросы атомной науки и техники
Теми:
Low temperature plasma and plasma technologies
Онлайн доступ:http://dspace.nbuv.gov.ua/handle/123456789/80327
Теги: Додати тег
Немає тегів, Будьте першим, хто поставить тег для цього запису!
Назва журналу:Digital Library of Periodicals of National Academy of Sciences of Ukraine
Цитувати:Ion kinetics in an ECR plasma source / C. Gutiérrez-Tapia // Вопросы атомной науки и техники. — 2002. — № 4. — С. 170-172. — Бібліогр.: 5 назв. — англ.

Репозиторії

Digital Library of Periodicals of National Academy of Sciences of Ukraine
id irk-123456789-80327
record_format dspace
spelling irk-123456789-803272015-04-15T03:01:50Z Ion kinetics in an ECR plasma source Gutiérrez-Tapia, C. Low temperature plasma and plasma technologies In plasma reactors it is extremely important the study for achieving greater control of critical parameters such as the flux velocities and the energy distribution of ions. These quantities are functions of the reactor physical dimensions, magnetic field profile as well as the kinetic chemical reactions occurring in the discharge. In this work, a model previously reported in [1] is improved. In that model using the drift kinetic equation approach the axial and radial ion fluxes at processing zone of an ECR plasma source are calculated. Now, the ionization rates are calculated from the energy distribution function obtained by a regularization method and using the experimental data of the electric probe measurements. Also, a more exact calculation of the external magnetic field is included. 2002 Article Ion kinetics in an ECR plasma source / C. Gutiérrez-Tapia // Вопросы атомной науки и техники. — 2002. — № 4. — С. 170-172. — Бібліогр.: 5 назв. — англ. 1562-6016 PACS: 52.50.-b http://dspace.nbuv.gov.ua/handle/123456789/80327 en Вопросы атомной науки и техники Національний науковий центр «Харківський фізико-технічний інститут» НАН України
institution Digital Library of Periodicals of National Academy of Sciences of Ukraine
collection DSpace DC
language English
topic Low temperature plasma and plasma technologies
Low temperature plasma and plasma technologies
spellingShingle Low temperature plasma and plasma technologies
Low temperature plasma and plasma technologies
Gutiérrez-Tapia, C.
Ion kinetics in an ECR plasma source
Вопросы атомной науки и техники
description In plasma reactors it is extremely important the study for achieving greater control of critical parameters such as the flux velocities and the energy distribution of ions. These quantities are functions of the reactor physical dimensions, magnetic field profile as well as the kinetic chemical reactions occurring in the discharge. In this work, a model previously reported in [1] is improved. In that model using the drift kinetic equation approach the axial and radial ion fluxes at processing zone of an ECR plasma source are calculated. Now, the ionization rates are calculated from the energy distribution function obtained by a regularization method and using the experimental data of the electric probe measurements. Also, a more exact calculation of the external magnetic field is included.
format Article
author Gutiérrez-Tapia, C.
author_facet Gutiérrez-Tapia, C.
author_sort Gutiérrez-Tapia, C.
title Ion kinetics in an ECR plasma source
title_short Ion kinetics in an ECR plasma source
title_full Ion kinetics in an ECR plasma source
title_fullStr Ion kinetics in an ECR plasma source
title_full_unstemmed Ion kinetics in an ECR plasma source
title_sort ion kinetics in an ecr plasma source
publisher Національний науковий центр «Харківський фізико-технічний інститут» НАН України
publishDate 2002
topic_facet Low temperature plasma and plasma technologies
url http://dspace.nbuv.gov.ua/handle/123456789/80327
citation_txt Ion kinetics in an ECR plasma source / C. Gutiérrez-Tapia // Вопросы атомной науки и техники. — 2002. — № 4. — С. 170-172. — Бібліогр.: 5 назв. — англ.
series Вопросы атомной науки и техники
work_keys_str_mv AT gutierreztapiac ionkineticsinanecrplasmasource
first_indexed 2023-10-18T19:20:44Z
last_indexed 2023-10-18T19:20:44Z
_version_ 1796146663712096256

Схожі ресурси