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Dynamic of wall currents in pulse plasma diode in tin vapor
In the paper the level of high-current pulse discharge plasma influence on the chamber wall is carried out, that is important for position choosing of the nanolithographer first collecting mirror with gas-discharge radiation source. In the high-current pulse discharge in tin vapor the dynamic of w...
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| Main Authors: | , , , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
Національний науковий центр «Харківський фізико-технічний інститут» НАН України
2011
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| Series: | Вопросы атомной науки и техники |
| Subjects: | |
| Online Access: | http://dspace.nbuv.gov.ua/handle/123456789/90952 |
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| Summary: | In the paper the level of high-current pulse discharge plasma influence on the chamber wall is carried out, that is
important for position choosing of the nanolithographer first collecting mirror with gas-discharge radiation source. In
the high-current pulse discharge in tin vapor the dynamic of wall currents space distribution and power of wall effect
were experimentally investigated. It has been shown, that the ring area in anode flat is undergone by main influence. It
was detected the rapid decreasing of energetic wall effect at distance from discharge axis increasing from 8 to 12 cm. |
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