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Plasma potential influence on ion energy Distribution function in ICP source

Plasma potential influence on ion energy Distribution function in ICP source

In this work, the deviation of energy distribution function of energetic ions from the predetermined value in an inductively coupled plasma (ICP) ion gun source is discussed. An abnormal plasma potential increase at an extraction voltage 400 V caused a beam energy shift of up to 50 eV compared to...

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Bibliographic Details
Main Authors: Vozniy, O.V., Yeom, G.Y., Kropotov, A.Yu.
Format: Article
Language:English
Published: Науковий фізико-технологічний центр МОН та НАН України 2007
Series:Физическая инженерия поверхности
Online Access:http://dspace.nbuv.gov.ua/handle/123456789/98816
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Summary:In this work, the deviation of energy distribution function of energetic ions from the predetermined value in an inductively coupled plasma (ICP) ion gun source is discussed. An abnormal plasma potential increase at an extraction voltage 400 V caused a beam energy shift of up to 50 eV compared to the preset value. The ion energy peak position was found to be more affected by pressure at higher extraction voltages on the acceleration grid.

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