Deposition of the stoichiometric coatings by reactive magnetron sputtering
The investigations of the reactive magnetron depositing of the stoichiometric coatings “metal-metalloid” were done. The dependences between sputtering parameters of a target and processes of plasmochemical formation on the surface of sample “metal-metalloid” and formations of coatings of the app...
Збережено в:
| Видавець: | Науковий фізико-технологічний центр МОН та НАН України |
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| Дата: | 2012 |
| Автори: | , , |
| Формат: | Стаття |
| Мова: | English |
| Опубліковано: |
Науковий фізико-технологічний центр МОН та НАН України
2012
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| Назва видання: | Физическая инженерия поверхности |
| Онлайн доступ: | http://dspace.nbuv.gov.ua/handle/123456789/98970 |
| Теги: |
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| Цитувати: | Deposition of the stoichiometric coatings by reactive magnetron sputtering / A. Sagalovych, S. Dudnik, V. Sagalovych // Физическая инженерия поверхности. — 2012. — Т. 10, № 3. — С. 263–272. — Бібліогр.: 23 назв. — англ. |
Репозиторії
Digital Library of Periodicals of National Academy of Sciences of Ukraine| Резюме: | The investigations of the reactive magnetron depositing of the stoichiometric coatings “metal-metalloid”
were done. The dependences between sputtering parameters of a target and processes of plasmochemical
formation on the surface of sample “metal-metalloid” and formations of coatings of the appropriate
structure were investigated. Experimental data on stoichiometric coatings AlN, Al₂O₃, TiN, TiO₂ is given. Features of reactive magnetron deposition and investigation results for obtaining of coatings with pregiven properties in
particular for providing stability and controllability of coating deposition processes in time. |
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