Deposition of TiO₂ thin films using atmospheric dielectric barrier discharge
In this paper the influence of precursor (titanium tetraisopropoxide (TTIP)) temperature, precursor and gas flow rates on the surface properties of TiO₂ thin films deposited by atmospheric dielectric barrier discharge (ADBD) chemical vapour deposition (CVD) were investigated. Argon was used as worki...
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| Published in: | Вопросы атомной науки и техники |
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| Date: | 2008 |
| Main Authors: | , |
| Format: | Article |
| Language: | English |
| Published: |
Національний науковий центр «Харківський фізико-технічний інститут» НАН України
2008
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| Subjects: | |
| Online Access: | https://nasplib.isofts.kiev.ua/handle/123456789/110976 |
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| Journal Title: | Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| Cite this: | Deposition of TiO₂ thin films using atmospheric dielectric barrier discharge / Y. Klenko, J. Píchal // Вопросы атомной науки и техники. — 2008. — № 6. — С. 177-179. — Бібліогр.: 12 назв. — англ. |
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