Electroreflectance spectroscopy and scanning electron microscopy study of microrelief silicon wafers with various surface pretreatments

The effect of various pretreatments on the performance of microrelief (textured) Si wafers was studied by the techniques of low-field electroreflectance spectroscopy, scanning electron microscopy, and electron diffraction. Four types of preliminary treatments were employed to prepare microrelief sur...

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Bibliographic Details
Published in:Semiconductor Physics Quantum Electronics & Optoelectronics
Date:1998
Main Authors: Gorbach, T.Ya., Holiney, R.Yu., Matiyuk, I.M., Matveeva, L.A., Svechnikov, S.V., Venger, E.F.
Format: Article
Language:English
Published: Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України 1998
Online Access:https://nasplib.isofts.kiev.ua/handle/123456789/114672
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Journal Title:Digital Library of Periodicals of National Academy of Sciences of Ukraine
Cite this:Electroreflectance spectroscopy and scanning electron microscopy study of microrelief silicon wafers with various surface pretreatments / T.Ya. Gorbach, R.Yu. Holiney, I.M. Matiyuk, L.A. Matveeva, S.V. Svechnikov, E.F. Venger // Semiconductor Physics Quantum Electronics & Optoelectronics. — 1998. — Т. 1, № 1. — С. 66-70. — Бібліогр.: 9 назв. — англ.

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Digital Library of Periodicals of National Academy of Sciences of Ukraine