Electroreflectance spectroscopy and scanning electron microscopy study of microrelief silicon wafers with various surface pretreatments
The effect of various pretreatments on the performance of microrelief (textured) Si wafers was studied by the techniques of low-field electroreflectance spectroscopy, scanning electron microscopy, and electron diffraction. Four types of preliminary treatments were employed to prepare microrelief sur...
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| Veröffentlicht in: | Semiconductor Physics Quantum Electronics & Optoelectronics |
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| Datum: | 1998 |
| Hauptverfasser: | , , , , , |
| Format: | Artikel |
| Sprache: | English |
| Veröffentlicht: |
Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
1998
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| Online Zugang: | https://nasplib.isofts.kiev.ua/handle/123456789/114672 |
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| Назва журналу: | Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| Zitieren: | Electroreflectance spectroscopy and scanning electron microscopy study of microrelief silicon wafers with various surface pretreatments / T.Ya. Gorbach, R.Yu. Holiney, I.M. Matiyuk, L.A. Matveeva, S.V. Svechnikov, E.F. Venger // Semiconductor Physics Quantum Electronics & Optoelectronics. — 1998. — Т. 1, № 1. — С. 66-70. — Бібліогр.: 9 назв. — англ. |