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Electroreflectance spectroscopy and scanning electron microscopy study of microrelief silicon wafers with various surface pretreatments

The effect of various pretreatments on the performance of microrelief (textured) Si wafers was studied by the techniques of low-field electroreflectance spectroscopy, scanning electron microscopy, and electron diffraction. Four types of preliminary treatments were employed to prepare microrelief sur...

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Veröffentlicht in:	Semiconductor Physics Quantum Electronics & Optoelectronics
Datum:	1998
Hauptverfasser:	Gorbach, T.Ya., Holiney, R.Yu., Matiyuk, I.M., Matveeva, L.A., Svechnikov, S.V., Venger, E.F.
Format:	Artikel
Sprache:	Englisch
Veröffentlicht:	Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України 1998
Online Zugang:	https://nasplib.isofts.kiev.ua/handle/123456789/114672
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!
Назва журналу:	Digital Library of Periodicals of National Academy of Sciences of Ukraine
Zitieren:	Electroreflectance spectroscopy and scanning electron microscopy study of microrelief silicon wafers with various surface pretreatments / T.Ya. Gorbach, R.Yu. Holiney, I.M. Matiyuk, L.A. Matveeva, S.V. Svechnikov, E.F. Venger // Semiconductor Physics Quantum Electronics & Optoelectronics. — 1998. — Т. 1, № 1. — С. 66-70. — Бібліогр.: 9 назв. — англ.

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Digital Library of Periodicals of National Academy of Sciences of Ukraine

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