Electroreflectance spectroscopy and scanning electron microscopy study of microrelief silicon wafers with various surface pretreatments

• Published in: Semiconductor Physics Quantum Electronics & Optoelectronics
• Date: 1998
• Main Authors: Gorbach, T.Ya., Holiney, R.Yu., Matiyuk, I.M., Matveeva, L.A., Svechnikov, S.V., Venger, E.F.
• Format: Article
• Language: English
• Published: Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України 1998
• Online Access: https://nasplib.isofts.kiev.ua/handle/123456789/114672
• Journal Title: Digital Library of Periodicals of National Academy of Sciences of Ukraine
• Cite this: Electroreflectance spectroscopy and scanning electron microscopy study of microrelief silicon wafers with various surface pretreatments / T.Ya. Gorbach, R.Yu. Holiney, I.M. Matiyuk, L.A. Matveeva, S.V. Svechnikov, E.F. Venger // Semiconductor Physics Quantum Electronics & Optoelectronics. — 1998. — Т. 1, № 1. — С. 66-70. — Бібліогр.: 9 назв. — англ.

The effect of various pretreatments on the performance of microrelief (textured) Si wafers was studied by the techniques of low-field electroreflectance spectroscopy, scanning electron microscopy, and electron diffraction. Four types of preliminary treatments were employed to prepare microrelief sur...