Role of dislocations in formation of ohmic contacts to heavily doped n-Si

We present experimental results concerning a high density of structural defects
 (in particular, dislocations) in the near-contact region of heavily doped n-silicon. They
 appear in the course of firing Au Pd Ti Pd -Si n ohmic contact at 450С for
 10 min in a vacuum of ~10 Pa...

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Published in:Semiconductor Physics Quantum Electronics & Optoelectronics
Date:2013
Main Authors: Belyaev, A.E., Pilipenko, V.A., Anischik, V.M., Petlitskaya, T.V., Klad’ko, V.P., Konakova, R.V., Boltovets, N.S., Korostinskaya, T.V., Kapitanchuk, L.M., Kudryk, Ya.Ya., Vinogradov, A.O., Sheremet, V.N.
Format: Article
Language:English
Published: Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України 2013
Online Access:https://nasplib.isofts.kiev.ua/handle/123456789/117675
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Journal Title:Digital Library of Periodicals of National Academy of Sciences of Ukraine
Cite this:Role of dislocations in formation of ohmic contacts
 to heavily doped n-Si / A.E. Belyaev, V.A. Pilipenko, V.M. Anischik, T.V. Petlitskaya, A.V. Sachenko, V.P. Klad’ko, R.V. Konakova, N.S. Boltovets, T.V. Korostinskaya, L.M. Kapitanchuk, Ya.Ya. Kudryk, A.O. Vinogradov, V.N. Sheremet // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2013. — Т. 16, № 2. — С. 99-110. — Бібліогр.: 35 назв. — англ.

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Digital Library of Periodicals of National Academy of Sciences of Ukraine
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author Belyaev, A.E.
Pilipenko, V.A.
Anischik, V.M.
Petlitskaya, T.V.
Klad’ko, V.P.
Konakova, R.V.
Boltovets, N.S.
Korostinskaya, T.V.
Kapitanchuk, L.M.
Kudryk, Ya.Ya.
Vinogradov, A.O.
Sheremet, V.N.
author_facet Belyaev, A.E.
Pilipenko, V.A.
Anischik, V.M.
Petlitskaya, T.V.
Klad’ko, V.P.
Konakova, R.V.
Boltovets, N.S.
Korostinskaya, T.V.
Kapitanchuk, L.M.
Kudryk, Ya.Ya.
Vinogradov, A.O.
Sheremet, V.N.
citation_txt Role of dislocations in formation of ohmic contacts
 to heavily doped n-Si / A.E. Belyaev, V.A. Pilipenko, V.M. Anischik, T.V. Petlitskaya, A.V. Sachenko, V.P. Klad’ko, R.V. Konakova, N.S. Boltovets, T.V. Korostinskaya, L.M. Kapitanchuk, Ya.Ya. Kudryk, A.O. Vinogradov, V.N. Sheremet // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2013. — Т. 16, № 2. — С. 99-110. — Бібліогр.: 35 назв. — англ.
collection DSpace DC
container_title Semiconductor Physics Quantum Electronics & Optoelectronics
description We present experimental results concerning a high density of structural defects
 (in particular, dislocations) in the near-contact region of heavily doped n-silicon. They
 appear in the course of firing Au Pd Ti Pd -Si n ohmic contact at 450С for
 10 min in a vacuum of ~10 Pa⁻⁴ . These defects lead to appearance of metal shunts that
 determine the current flow mechanism in these ohmic contacts. The calculated and
 experimental temperature dependences of contact resistivity, ρс(Т), are in good
 agreement. It is shown that ρс increases with temperature. This is characteristic of a
 model of ohmic contacts with a high dislocation density in the near-contact region of
 semiconductor
first_indexed 2025-12-07T16:48:39Z
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institution Digital Library of Periodicals of National Academy of Sciences of Ukraine
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language English
last_indexed 2025-12-07T16:48:39Z
publishDate 2013
publisher Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
record_format dspace
spelling Belyaev, A.E.
Pilipenko, V.A.
Anischik, V.M.
Petlitskaya, T.V.
Klad’ko, V.P.
Konakova, R.V.
Boltovets, N.S.
Korostinskaya, T.V.
Kapitanchuk, L.M.
Kudryk, Ya.Ya.
Vinogradov, A.O.
Sheremet, V.N.
2017-05-26T08:55:12Z
2017-05-26T08:55:12Z
2013
Role of dislocations in formation of ohmic contacts
 to heavily doped n-Si / A.E. Belyaev, V.A. Pilipenko, V.M. Anischik, T.V. Petlitskaya, A.V. Sachenko, V.P. Klad’ko, R.V. Konakova, N.S. Boltovets, T.V. Korostinskaya, L.M. Kapitanchuk, Ya.Ya. Kudryk, A.O. Vinogradov, V.N. Sheremet // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2013. — Т. 16, № 2. — С. 99-110. — Бібліогр.: 35 назв. — англ.
1560-8034
PACS 73.40.Ns; 73.40.Cg, 85.40.-e
https://nasplib.isofts.kiev.ua/handle/123456789/117675
We present experimental results concerning a high density of structural defects
 (in particular, dislocations) in the near-contact region of heavily doped n-silicon. They
 appear in the course of firing Au Pd Ti Pd -Si n ohmic contact at 450С for
 10 min in a vacuum of ~10 Pa⁻⁴ . These defects lead to appearance of metal shunts that
 determine the current flow mechanism in these ohmic contacts. The calculated and
 experimental temperature dependences of contact resistivity, ρс(Т), are in good
 agreement. It is shown that ρс increases with temperature. This is characteristic of a
 model of ohmic contacts with a high dislocation density in the near-contact region of
 semiconductor
This work was supported by the State Fund for
 Fundamental Researches SFFR-BRFFR-2013 (Project
 54.1/012).
en
Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
Semiconductor Physics Quantum Electronics & Optoelectronics
Role of dislocations in formation of ohmic contacts to heavily doped n-Si
Article
published earlier
spellingShingle Role of dislocations in formation of ohmic contacts to heavily doped n-Si
Belyaev, A.E.
Pilipenko, V.A.
Anischik, V.M.
Petlitskaya, T.V.
Klad’ko, V.P.
Konakova, R.V.
Boltovets, N.S.
Korostinskaya, T.V.
Kapitanchuk, L.M.
Kudryk, Ya.Ya.
Vinogradov, A.O.
Sheremet, V.N.
title Role of dislocations in formation of ohmic contacts to heavily doped n-Si
title_full Role of dislocations in formation of ohmic contacts to heavily doped n-Si
title_fullStr Role of dislocations in formation of ohmic contacts to heavily doped n-Si
title_full_unstemmed Role of dislocations in formation of ohmic contacts to heavily doped n-Si
title_short Role of dislocations in formation of ohmic contacts to heavily doped n-Si
title_sort role of dislocations in formation of ohmic contacts to heavily doped n-si
url https://nasplib.isofts.kiev.ua/handle/123456789/117675
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