Nucleation, growth and transformation of microdefects in FZ-Si

The physical model of microdefects formation in dislocation-free FZ-Si single crystals is offered. Experimental results and theoretical data allows to approve that recombination between vacancy and self-interstitials at high temperatures is hampered by an entropy barrier. Established is that the pro...

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Published in:Semiconductor Physics Quantum Electronics & Optoelectronics
Date:2004
Main Authors: Talanin, V.I., Talanin, I.E.
Format: Article
Language:English
Published: Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України 2004
Online Access:https://nasplib.isofts.kiev.ua/handle/123456789/118108
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Journal Title:Digital Library of Periodicals of National Academy of Sciences of Ukraine
Cite this:Nucleation, growth and transformation of microdefects in FZ-Si / V.I. Talanin, I.E. Talanin // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2004. — Т. 7, № 1. — С. 16-21. — Бібліогр.: 50 назв. — англ.

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Digital Library of Periodicals of National Academy of Sciences of Ukraine
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author Talanin, V.I.
Talanin, I.E.
author_facet Talanin, V.I.
Talanin, I.E.
citation_txt Nucleation, growth and transformation of microdefects in FZ-Si / V.I. Talanin, I.E. Talanin // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2004. — Т. 7, № 1. — С. 16-21. — Бібліогр.: 50 назв. — англ.
collection DSpace DC
container_title Semiconductor Physics Quantum Electronics & Optoelectronics
description The physical model of microdefects formation in dislocation-free FZ-Si single crystals is offered. Experimental results and theoretical data allows to approve that recombination between vacancy and self-interstitials at high temperatures is hampered by an entropy barrier. Established is that the process of microdefects formation in silicon proceeds simultaneously by two independent mechanisms: the vacancy and interstitial ones.
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institution Digital Library of Periodicals of National Academy of Sciences of Ukraine
issn 1560-8034
language English
last_indexed 2025-12-07T17:31:14Z
publishDate 2004
publisher Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
record_format dspace
spelling Talanin, V.I.
Talanin, I.E.
2017-05-28T17:30:23Z
2017-05-28T17:30:23Z
2004
Nucleation, growth and transformation of microdefects in FZ-Si / V.I. Talanin, I.E. Talanin // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2004. — Т. 7, № 1. — С. 16-21. — Бібліогр.: 50 назв. — англ.
1560-8034
PACS: 61.72.Bb; 61.72.Ji; 61.72.Yx
https://nasplib.isofts.kiev.ua/handle/123456789/118108
The physical model of microdefects formation in dislocation-free FZ-Si single crystals is offered. Experimental results and theoretical data allows to approve that recombination between vacancy and self-interstitials at high temperatures is hampered by an entropy barrier. Established is that the process of microdefects formation in silicon proceeds simultaneously by two independent mechanisms: the vacancy and interstitial ones.
en
Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
Semiconductor Physics Quantum Electronics & Optoelectronics
Nucleation, growth and transformation of microdefects in FZ-Si
Article
published earlier
spellingShingle Nucleation, growth and transformation of microdefects in FZ-Si
Talanin, V.I.
Talanin, I.E.
title Nucleation, growth and transformation of microdefects in FZ-Si
title_full Nucleation, growth and transformation of microdefects in FZ-Si
title_fullStr Nucleation, growth and transformation of microdefects in FZ-Si
title_full_unstemmed Nucleation, growth and transformation of microdefects in FZ-Si
title_short Nucleation, growth and transformation of microdefects in FZ-Si
title_sort nucleation, growth and transformation of microdefects in fz-si
url https://nasplib.isofts.kiev.ua/handle/123456789/118108
work_keys_str_mv AT talaninvi nucleationgrowthandtransformationofmicrodefectsinfzsi
AT talaninie nucleationgrowthandtransformationofmicrodefectsinfzsi