Optical study of thermally induced phase separation in evaporated SiOx films
SiOx thin films (x ~1.3) have been prepared by thermal vacuum evaporation of silicon monoxide. A thermally stimulated (annealling temperatures – 700 and 1000°C) structural transformation of the Si-O phase in the SiOx layers, which leads to the formation of amorphous and crystalline Si nanoinclusions...
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| Published in: | Semiconductor Physics Quantum Electronics & Optoelectronics |
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| Date: | 2004 |
| Main Authors: | , , , , , |
| Format: | Article |
| Language: | English |
| Published: |
Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
2004
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| Online Access: | https://nasplib.isofts.kiev.ua/handle/123456789/118167 |
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| Journal Title: | Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| Cite this: | Optical study of thermally induced phase separation in evaporated SiOx films / I.Z. Indutnyy, I.P. Lisovskyy, D.O. Mazunov, P.E. Shepeliavyi, G.Yu. Rudko, V.A. Dan'ko // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2004. — Т. 7, № 2. — С. 161-167. — Бібліогр.: 33 назв. — англ. |