Characteristics of gettering process in multicrystalline Si wafers with combined porous Si/Al getters

In this work, the gettering process in the multicrystalline Si wafers by the combined getter structures of the porous Si and Al layers during annealings at temperatures 600 up to 750 °C has been theoretically studied. A kinetic model based on the diffusion equation has been developed, and the charac...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Semiconductor Physics Quantum Electronics & Optoelectronics
Datum:2012
Hauptverfasser: Sarikov, A., Naseka, V.
Format: Artikel
Sprache:English
Veröffentlicht: Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України 2012
Online Zugang:https://nasplib.isofts.kiev.ua/handle/123456789/118257
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Назва журналу:Digital Library of Periodicals of National Academy of Sciences of Ukraine
Zitieren:Characteristics of gettering process in multicrystalline Si wafers with combined porous Si/Al getters / Sarikov, V. Naseka // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2012. — Т. 15, № 1. — С. 8-12. — Бібліогр.: 11 назв. — англ.

Institution

Digital Library of Periodicals of National Academy of Sciences of Ukraine
id nasplib_isofts_kiev_ua-123456789-118257
record_format dspace
spelling Sarikov, A.
Naseka, V.
2017-05-29T14:12:23Z
2017-05-29T14:12:23Z
2012
Characteristics of gettering process in multicrystalline Si wafers with combined porous Si/Al getters / Sarikov, V. Naseka // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2012. — Т. 15, № 1. — С. 8-12. — Бібліогр.: 11 назв. — англ.
1560-8034
PACS 61.72, 81.65.Tx
https://nasplib.isofts.kiev.ua/handle/123456789/118257
In this work, the gettering process in the multicrystalline Si wafers by the combined getter structures of the porous Si and Al layers during annealings at temperatures 600 up to 750 °C has been theoretically studied. A kinetic model based on the diffusion equation has been developed, and the characteristics of increase in the minority charge carrier diffusion length as a result of gettering annealings have been determined. The obtained results are useful for technology of multicrystalline Si solar cells to improve their properties.
This work has been carried out in the framework of the State Targeted Scientific and Technological Program “Creation of Chemical and Metallurgical Branch of the Production of Pure Silicon Material” during 2011 to 2015 (project − 3.31 “Development and implementation of the technology for the formation of stress-free homogeneous Si ingots”)
en
Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
Semiconductor Physics Quantum Electronics & Optoelectronics
Characteristics of gettering process in multicrystalline Si wafers with combined porous Si/Al getters
Article
published earlier
institution Digital Library of Periodicals of National Academy of Sciences of Ukraine
collection DSpace DC
title Characteristics of gettering process in multicrystalline Si wafers with combined porous Si/Al getters
spellingShingle Characteristics of gettering process in multicrystalline Si wafers with combined porous Si/Al getters
Sarikov, A.
Naseka, V.
title_short Characteristics of gettering process in multicrystalline Si wafers with combined porous Si/Al getters
title_full Characteristics of gettering process in multicrystalline Si wafers with combined porous Si/Al getters
title_fullStr Characteristics of gettering process in multicrystalline Si wafers with combined porous Si/Al getters
title_full_unstemmed Characteristics of gettering process in multicrystalline Si wafers with combined porous Si/Al getters
title_sort characteristics of gettering process in multicrystalline si wafers with combined porous si/al getters
author Sarikov, A.
Naseka, V.
author_facet Sarikov, A.
Naseka, V.
publishDate 2012
language English
container_title Semiconductor Physics Quantum Electronics & Optoelectronics
publisher Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
format Article
description In this work, the gettering process in the multicrystalline Si wafers by the combined getter structures of the porous Si and Al layers during annealings at temperatures 600 up to 750 °C has been theoretically studied. A kinetic model based on the diffusion equation has been developed, and the characteristics of increase in the minority charge carrier diffusion length as a result of gettering annealings have been determined. The obtained results are useful for technology of multicrystalline Si solar cells to improve their properties.
issn 1560-8034
url https://nasplib.isofts.kiev.ua/handle/123456789/118257
citation_txt Characteristics of gettering process in multicrystalline Si wafers with combined porous Si/Al getters / Sarikov, V. Naseka // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2012. — Т. 15, № 1. — С. 8-12. — Бібліогр.: 11 назв. — англ.
work_keys_str_mv AT sarikova characteristicsofgetteringprocessinmulticrystallinesiwaferswithcombinedporoussialgetters
AT nasekav characteristicsofgetteringprocessinmulticrystallinesiwaferswithcombinedporoussialgetters
first_indexed 2025-12-07T20:57:16Z
last_indexed 2025-12-07T20:57:16Z
_version_ 1850884527101050880