Analysis of methods for high-speed forming the relief microimages on metallic substrates

• Veröffentlicht in: Semiconductor Physics Quantum Electronics & Optoelectronics
• Datum: 2007
• Hauptverfasser: Kryuchin, A.A., Pankratova, A.V., Kassko, I.A., Nagorny, F.V., Chirkov, D.V.
• Format: Artikel
• Sprache: Englisch
• Veröffentlicht: Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України 2007
• Online Zugang: https://nasplib.isofts.kiev.ua/handle/123456789/118339
• Назва журналу: Digital Library of Periodicals of National Academy of Sciences of Ukraine
• Zitieren: Analysis of methods for high-speed forming the relief microimages on metallic substrates / A.A. Kryuchin, A.V. Pankratova, I.A. Kassko, F.V.Nagorny, D.V.Chirkov // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2007. — Т. 10, № 4. — С. 87-93. — Бібліогр.: 17 назв. — англ.

The use of methods of ion and electrochemical etching of metallic substrates
 to obtain relief microstructures with micron and submicron sizes is considered. Presented
 are the results of experimental researches of processes aimed at manufacturing metallic
 carriers by using...