Analysis of methods for high-speed forming the relief microimages on metallic substrates
The use of methods of ion and electrochemical etching of metallic substrates
 to obtain relief microstructures with micron and submicron sizes is considered. Presented
 are the results of experimental researches of processes aimed at manufacturing metallic
 carriers by using...
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| Veröffentlicht in: | Semiconductor Physics Quantum Electronics & Optoelectronics |
|---|---|
| Datum: | 2007 |
| Hauptverfasser: | , , , , |
| Format: | Artikel |
| Sprache: | Englisch |
| Veröffentlicht: |
Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
2007
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| Online Zugang: | https://nasplib.isofts.kiev.ua/handle/123456789/118339 |
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| Назва журналу: | Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| Zitieren: | Analysis of methods for high-speed forming the relief microimages on metallic substrates / A.A. Kryuchin, A.V. Pankratova, I.A. Kassko, F.V.Nagorny, D.V.Chirkov // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2007. — Т. 10, № 4. — С. 87-93. — Бібліогр.: 17 назв. — англ. |
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Digital Library of Periodicals of National Academy of Sciences of Ukraine| _version_ | 1862718584800673792 |
|---|---|
| author | Kryuchin, A.A. Pankratova, A.V. Kassko, I.A. Nagorny, F.V. Chirkov, D.V. |
| author_facet | Kryuchin, A.A. Pankratova, A.V. Kassko, I.A. Nagorny, F.V. Chirkov, D.V. |
| citation_txt | Analysis of methods for high-speed forming the relief microimages on metallic substrates / A.A. Kryuchin, A.V. Pankratova, I.A. Kassko, F.V.Nagorny, D.V.Chirkov // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2007. — Т. 10, № 4. — С. 87-93. — Бібліогр.: 17 назв. — англ. |
| collection | DSpace DC |
| container_title | Semiconductor Physics Quantum Electronics & Optoelectronics |
| description | The use of methods of ion and electrochemical etching of metallic substrates
to obtain relief microstructures with micron and submicron sizes is considered. Presented
are the results of experimental researches of processes aimed at manufacturing metallic
carriers by using inorganic photoresists.
|
| first_indexed | 2025-12-07T18:15:57Z |
| format | Article |
| fulltext | |
| id | nasplib_isofts_kiev_ua-123456789-118339 |
| institution | Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| issn | 1560-8034 |
| language | English |
| last_indexed | 2025-12-07T18:15:57Z |
| publishDate | 2007 |
| publisher | Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України |
| record_format | dspace |
| spelling | Kryuchin, A.A. Pankratova, A.V. Kassko, I.A. Nagorny, F.V. Chirkov, D.V. 2017-05-29T19:32:28Z 2017-05-29T19:32:28Z 2007 Analysis of methods for high-speed forming the relief microimages on metallic substrates / A.A. Kryuchin, A.V. Pankratova, I.A. Kassko, F.V.Nagorny, D.V.Chirkov // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2007. — Т. 10, № 4. — С. 87-93. — Бібліогр.: 17 назв. — англ. 1560-8034 PACS 42.40.Ht, 42.79.Vb, 81.65.Cf https://nasplib.isofts.kiev.ua/handle/123456789/118339 The use of methods of ion and electrochemical etching of metallic substrates
 to obtain relief microstructures with micron and submicron sizes is considered. Presented
 are the results of experimental researches of processes aimed at manufacturing metallic
 carriers by using inorganic photoresists. en Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України Semiconductor Physics Quantum Electronics & Optoelectronics Analysis of methods for high-speed forming the relief microimages on metallic substrates Article published earlier |
| spellingShingle | Analysis of methods for high-speed forming the relief microimages on metallic substrates Kryuchin, A.A. Pankratova, A.V. Kassko, I.A. Nagorny, F.V. Chirkov, D.V. |
| title | Analysis of methods for high-speed forming the relief microimages on metallic substrates |
| title_full | Analysis of methods for high-speed forming the relief microimages on metallic substrates |
| title_fullStr | Analysis of methods for high-speed forming the relief microimages on metallic substrates |
| title_full_unstemmed | Analysis of methods for high-speed forming the relief microimages on metallic substrates |
| title_short | Analysis of methods for high-speed forming the relief microimages on metallic substrates |
| title_sort | analysis of methods for high-speed forming the relief microimages on metallic substrates |
| url | https://nasplib.isofts.kiev.ua/handle/123456789/118339 |
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