Chemical composition and light emission properties of Si-rich-SiOx layers prepared by magnetron sputtering
The process of thermal decomposition of SiOx layers prepared by magnetron
 sputtering is studied with the use of photoluminescence and Auger and SIMS
 spectroscopies. From these measurements, we obtained the distributions of the emission
 properties and the chemical compositi...
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| Опубліковано в: : | Semiconductor Physics Quantum Electronics & Optoelectronics |
|---|---|
| Дата: | 2007 |
| Автори: | , , , |
| Формат: | Стаття |
| Мова: | Англійська |
| Опубліковано: |
Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
2007
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| Онлайн доступ: | https://nasplib.isofts.kiev.ua/handle/123456789/118344 |
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| Назва журналу: | Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| Цитувати: | Chemical composition and light emission properties of Si-rich-SiOx layers prepared by magnetron sputtering / L. Khomenkova, N. Korsunska, M. Sheinkman, T. Stara // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2007. — Т. 10, № 4. — С. 21-25. — Бібліогр.: 16 назв. — англ. |
Репозитарії
Digital Library of Periodicals of National Academy of Sciences of Ukraine| _version_ | 1862701575765491712 |
|---|---|
| author | Khomenkova, L. Korsunska, N. Sheinkman, M. Stara, T. |
| author_facet | Khomenkova, L. Korsunska, N. Sheinkman, M. Stara, T. |
| citation_txt | Chemical composition and light emission properties of Si-rich-SiOx layers prepared by magnetron sputtering / L. Khomenkova, N. Korsunska, M. Sheinkman, T. Stara // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2007. — Т. 10, № 4. — С. 21-25. — Бібліогр.: 16 назв. — англ. |
| collection | DSpace DC |
| container_title | Semiconductor Physics Quantum Electronics & Optoelectronics |
| description | The process of thermal decomposition of SiOx layers prepared by magnetron
sputtering is studied with the use of photoluminescence and Auger and SIMS
spectroscopies. From these measurements, we obtained the distributions of the emission
properties and the chemical composition over the depth. The effect of the redistribution
of silicon and oxygen over the depth is found after the high-temperature annealing which
results in the formation of a Si nanocrystal. These redistributions result in the appearance
of a Si-depleted region near the layer-substrate interface. The formation of a depletion
layer is dependent on the excess of Si. A decrease of the silicon content over the depth of
annealed layers is accompanied by a decrease of the Si nanocrystal size, as it is
evidenced by the blue shift of the photoluminescence maximum. The mechanism of
decomposition of SiOx and the possible reasons for the appearance of a Si-depleted
region are discussed.
|
| first_indexed | 2025-12-07T16:42:22Z |
| format | Article |
| fulltext | |
| id | nasplib_isofts_kiev_ua-123456789-118344 |
| institution | Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| issn | 1560-8034 |
| language | English |
| last_indexed | 2025-12-07T16:42:22Z |
| publishDate | 2007 |
| publisher | Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України |
| record_format | dspace |
| spelling | Khomenkova, L. Korsunska, N. Sheinkman, M. Stara, T. 2017-05-29T19:38:28Z 2017-05-29T19:38:28Z 2007 Chemical composition and light emission properties of Si-rich-SiOx layers prepared by magnetron sputtering / L. Khomenkova, N. Korsunska, M. Sheinkman, T. Stara // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2007. — Т. 10, № 4. — С. 21-25. — Бібліогр.: 16 назв. — англ. 1560-8034 PACS 78.55.-m, 79.60.-i, 82.80.-d, 82.80.Ms https://nasplib.isofts.kiev.ua/handle/123456789/118344 The process of thermal decomposition of SiOx layers prepared by magnetron
 sputtering is studied with the use of photoluminescence and Auger and SIMS
 spectroscopies. From these measurements, we obtained the distributions of the emission
 properties and the chemical composition over the depth. The effect of the redistribution
 of silicon and oxygen over the depth is found after the high-temperature annealing which
 results in the formation of a Si nanocrystal. These redistributions result in the appearance
 of a Si-depleted region near the layer-substrate interface. The formation of a depletion
 layer is dependent on the excess of Si. A decrease of the silicon content over the depth of
 annealed layers is accompanied by a decrease of the Si nanocrystal size, as it is
 evidenced by the blue shift of the photoluminescence maximum. The mechanism of
 decomposition of SiOx and the possible reasons for the appearance of a Si-depleted
 region are discussed. This work was supported by the National Academy of
 Sciences of Ukraine. The authors thank C. Sada and E.
 Trave (University of Padua, Italy) for the help in the
 SIMS measurements and Y. Goldstein, J. Jedrzejewski,
 and E. Savir (Hebrew University, Israel) for providing
 the samples. en Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України Semiconductor Physics Quantum Electronics & Optoelectronics Chemical composition and light emission properties of Si-rich-SiOx layers prepared by magnetron sputtering Article published earlier |
| spellingShingle | Chemical composition and light emission properties of Si-rich-SiOx layers prepared by magnetron sputtering Khomenkova, L. Korsunska, N. Sheinkman, M. Stara, T. |
| title | Chemical composition and light emission properties of Si-rich-SiOx layers prepared by magnetron sputtering |
| title_full | Chemical composition and light emission properties of Si-rich-SiOx layers prepared by magnetron sputtering |
| title_fullStr | Chemical composition and light emission properties of Si-rich-SiOx layers prepared by magnetron sputtering |
| title_full_unstemmed | Chemical composition and light emission properties of Si-rich-SiOx layers prepared by magnetron sputtering |
| title_short | Chemical composition and light emission properties of Si-rich-SiOx layers prepared by magnetron sputtering |
| title_sort | chemical composition and light emission properties of si-rich-siox layers prepared by magnetron sputtering |
| url | https://nasplib.isofts.kiev.ua/handle/123456789/118344 |
| work_keys_str_mv | AT khomenkoval chemicalcompositionandlightemissionpropertiesofsirichsioxlayerspreparedbymagnetronsputtering AT korsunskan chemicalcompositionandlightemissionpropertiesofsirichsioxlayerspreparedbymagnetronsputtering AT sheinkmanm chemicalcompositionandlightemissionpropertiesofsirichsioxlayerspreparedbymagnetronsputtering AT starat chemicalcompositionandlightemissionpropertiesofsirichsioxlayerspreparedbymagnetronsputtering |