Double- and triple-crystal X-ray diffractometry of microdefects in silicon

The generalized dynamical theory of X-ray scattering by real single crystals
 allows to self-consistently describe intensities of coherent and diffuse scattering
 measured by double- and triple-crystal diffractometers (DCD and TCD) from single
 crystals with defects in crysta...

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Veröffentlicht in:Semiconductor Physics Quantum Electronics & Optoelectronics
Datum:2010
Hauptverfasser: Molodkin, V.B., Olikhovskii, S.I., Kyslovskyy, Ye.M., Len, E.G., Reshetnyk, O.V., Vladimirova, T.P., V.V. Lizunov, V.V., Lizunova, S.V.
Format: Artikel
Sprache:Englisch
Veröffentlicht: Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України 2010
Online Zugang:https://nasplib.isofts.kiev.ua/handle/123456789/118577
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Назва журналу:Digital Library of Periodicals of National Academy of Sciences of Ukraine
Zitieren:Double- and triple-crystal X-ray diffractometry
 of microdefects in silicon / V.B. Molodkin, S.I. Olikhovskii, Ye.M. Kyslovskyy, E.G. Len, O.V. Reshetnyk, T.P. Vladimirova, V.V. Lizunov, S.V. Lizunova // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2010. — Т. 13, № 4. — С. 353-356. — Бібліогр.: 20 назв. — англ.

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Digital Library of Periodicals of National Academy of Sciences of Ukraine
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author Molodkin, V.B.
Olikhovskii, S.I.
Kyslovskyy, Ye.M.
Len, E.G.
Reshetnyk, O.V.
Vladimirova, T.P.
V.V. Lizunov, V.V.
Lizunova, S.V.
author_facet Molodkin, V.B.
Olikhovskii, S.I.
Kyslovskyy, Ye.M.
Len, E.G.
Reshetnyk, O.V.
Vladimirova, T.P.
V.V. Lizunov, V.V.
Lizunova, S.V.
citation_txt Double- and triple-crystal X-ray diffractometry
 of microdefects in silicon / V.B. Molodkin, S.I. Olikhovskii, Ye.M. Kyslovskyy, E.G. Len, O.V. Reshetnyk, T.P. Vladimirova, V.V. Lizunov, S.V. Lizunova // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2010. — Т. 13, № 4. — С. 353-356. — Бібліогр.: 20 назв. — англ.
collection DSpace DC
container_title Semiconductor Physics Quantum Electronics & Optoelectronics
description The generalized dynamical theory of X-ray scattering by real single crystals
 allows to self-consistently describe intensities of coherent and diffuse scattering
 measured by double- and triple-crystal diffractometers (DCD and TCD) from single
 crystals with defects in crystal bulk and with strained subsurface layers. Being based on
 this theory, we offer the combined DCD+TCD method that exhibits the higher sensitivity
 to defect structures with wide size distributions as compared with any of these methods
 alone. In the investigated Czochralski-grown silicon crystals, the sizes and concentrations
 of small oxygen precipitates as well as small and large dislocation loops have been
 determined using this method.
first_indexed 2025-12-07T16:18:38Z
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id nasplib_isofts_kiev_ua-123456789-118577
institution Digital Library of Periodicals of National Academy of Sciences of Ukraine
issn 1560-8034
language English
last_indexed 2025-12-07T16:18:38Z
publishDate 2010
publisher Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
record_format dspace
spelling Molodkin, V.B.
Olikhovskii, S.I.
Kyslovskyy, Ye.M.
Len, E.G.
Reshetnyk, O.V.
Vladimirova, T.P.
V.V. Lizunov, V.V.
Lizunova, S.V.
2017-05-30T16:30:54Z
2017-05-30T16:30:54Z
2010
Double- and triple-crystal X-ray diffractometry
 of microdefects in silicon / V.B. Molodkin, S.I. Olikhovskii, Ye.M. Kyslovskyy, E.G. Len, O.V. Reshetnyk, T.P. Vladimirova, V.V. Lizunov, S.V. Lizunova // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2010. — Т. 13, № 4. — С. 353-356. — Бібліогр.: 20 назв. — англ.
1560-8034
PACS 61.72.Dd
https://nasplib.isofts.kiev.ua/handle/123456789/118577
The generalized dynamical theory of X-ray scattering by real single crystals
 allows to self-consistently describe intensities of coherent and diffuse scattering
 measured by double- and triple-crystal diffractometers (DCD and TCD) from single
 crystals with defects in crystal bulk and with strained subsurface layers. Being based on
 this theory, we offer the combined DCD+TCD method that exhibits the higher sensitivity
 to defect structures with wide size distributions as compared with any of these methods
 alone. In the investigated Czochralski-grown silicon crystals, the sizes and concentrations
 of small oxygen precipitates as well as small and large dislocation loops have been
 determined using this method.
en
Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
Semiconductor Physics Quantum Electronics & Optoelectronics
Double- and triple-crystal X-ray diffractometry of microdefects in silicon
Article
published earlier
spellingShingle Double- and triple-crystal X-ray diffractometry of microdefects in silicon
Molodkin, V.B.
Olikhovskii, S.I.
Kyslovskyy, Ye.M.
Len, E.G.
Reshetnyk, O.V.
Vladimirova, T.P.
V.V. Lizunov, V.V.
Lizunova, S.V.
title Double- and triple-crystal X-ray diffractometry of microdefects in silicon
title_full Double- and triple-crystal X-ray diffractometry of microdefects in silicon
title_fullStr Double- and triple-crystal X-ray diffractometry of microdefects in silicon
title_full_unstemmed Double- and triple-crystal X-ray diffractometry of microdefects in silicon
title_short Double- and triple-crystal X-ray diffractometry of microdefects in silicon
title_sort double- and triple-crystal x-ray diffractometry of microdefects in silicon
url https://nasplib.isofts.kiev.ua/handle/123456789/118577
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