Using ellipsometry methods for depth analyzing the optical disc data layer relief structures

We studied the relief depth of the data layer formed in a glass disk by ion beam
 etching process with using classical ellipsometry at the constant wavelength 632.8 nm for
 different angles of incidence. It was found that for 0° and 90° azimuth angles, a pair of
 ellipsometri...

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Published in:Semiconductor Physics Quantum Electronics & Optoelectronics
Date:2008
Main Authors: Kravets, V.G., Gorbov, I.V.
Format: Article
Language:English
Published: Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України 2008
Online Access:https://nasplib.isofts.kiev.ua/handle/123456789/118596
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Journal Title:Digital Library of Periodicals of National Academy of Sciences of Ukraine
Cite this:Using ellipsometry methods for depth analyzing the optical disc data layer relief structures / V.G. Kravets, I.V. Gorbov // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2008. — Т. 11, № 1. — С. 11-15. — Бібліогр.: 8 назв. — англ.

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Digital Library of Periodicals of National Academy of Sciences of Ukraine
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author Kravets, V.G.
Gorbov, I.V.
author_facet Kravets, V.G.
Gorbov, I.V.
citation_txt Using ellipsometry methods for depth analyzing the optical disc data layer relief structures / V.G. Kravets, I.V. Gorbov // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2008. — Т. 11, № 1. — С. 11-15. — Бібліогр.: 8 назв. — англ.
collection DSpace DC
container_title Semiconductor Physics Quantum Electronics & Optoelectronics
description We studied the relief depth of the data layer formed in a glass disk by ion beam
 etching process with using classical ellipsometry at the constant wavelength 632.8 nm for
 different angles of incidence. It was found that for 0° and 90° azimuth angles, a pair of
 ellipsometric parameters Ψ and ∆ is sufficient to characterize the changes in light
 reflection for various structure depths. The depth of optical disc data layer relief
 structures was estimated via experimental dependences of ellipsometric parameters. The
 estimated data layer depths were found to be in good agreement with independent
 tunnelling electron microscopy measurements.
first_indexed 2025-11-25T22:33:23Z
format Article
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institution Digital Library of Periodicals of National Academy of Sciences of Ukraine
issn 1560-8034
language English
last_indexed 2025-11-25T22:33:23Z
publishDate 2008
publisher Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
record_format dspace
spelling Kravets, V.G.
Gorbov, I.V.
2017-05-30T17:02:34Z
2017-05-30T17:02:34Z
2008
Using ellipsometry methods for depth analyzing the optical disc data layer relief structures / V.G. Kravets, I.V. Gorbov // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2008. — Т. 11, № 1. — С. 11-15. — Бібліогр.: 8 назв. — англ.
1560-8034
PACS 42.79.Vb
https://nasplib.isofts.kiev.ua/handle/123456789/118596
We studied the relief depth of the data layer formed in a glass disk by ion beam
 etching process with using classical ellipsometry at the constant wavelength 632.8 nm for
 different angles of incidence. It was found that for 0° and 90° azimuth angles, a pair of
 ellipsometric parameters Ψ and ∆ is sufficient to characterize the changes in light
 reflection for various structure depths. The depth of optical disc data layer relief
 structures was estimated via experimental dependences of ellipsometric parameters. The
 estimated data layer depths were found to be in good agreement with independent
 tunnelling electron microscopy measurements.
en
Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
Semiconductor Physics Quantum Electronics & Optoelectronics
Using ellipsometry methods for depth analyzing the optical disc data layer relief structures
Article
published earlier
spellingShingle Using ellipsometry methods for depth analyzing the optical disc data layer relief structures
Kravets, V.G.
Gorbov, I.V.
title Using ellipsometry methods for depth analyzing the optical disc data layer relief structures
title_full Using ellipsometry methods for depth analyzing the optical disc data layer relief structures
title_fullStr Using ellipsometry methods for depth analyzing the optical disc data layer relief structures
title_full_unstemmed Using ellipsometry methods for depth analyzing the optical disc data layer relief structures
title_short Using ellipsometry methods for depth analyzing the optical disc data layer relief structures
title_sort using ellipsometry methods for depth analyzing the optical disc data layer relief structures
url https://nasplib.isofts.kiev.ua/handle/123456789/118596
work_keys_str_mv AT kravetsvg usingellipsometrymethodsfordepthanalyzingtheopticaldiscdatalayerreliefstructures
AT gorboviv usingellipsometrymethodsfordepthanalyzingtheopticaldiscdatalayerreliefstructures