Mechanical scanning probe nanolithography: modeling and application

• Опубліковано в: : Semiconductor Physics Quantum Electronics & Optoelectronics
• Дата: 2012
• Автори: Lytvyn, P.M., Lytvyn, O.S., Dyachyns’ka, O.M., Grytsenko, K.P., Schrader, S., Prokopenko, I.V.
• Формат: Стаття
• Мова: Англійська
• Опубліковано: Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України 2012
• Онлайн доступ: https://nasplib.isofts.kiev.ua/handle/123456789/118721
• Назва журналу: Digital Library of Periodicals of National Academy of Sciences of Ukraine
• Цитувати: Mechanical scanning probe nanolithography:
 modeling and application / P.M. Lytvyn, O.S. Lytvyn, O.M. Dyachyns’ka, K.P. Grytsenko, S. Schrader, I.V. Prokopenko // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2012. — Т. 15, № 4. — С. 321-327. — Бібліогр.: 23 назв. — англ.

The paper presents a study on modeling the mechanical interaction between the tip of a
 scanning atomic force microscope (AFM) and surfaces of various types, which makes it
 possible to optimize parameters and modes for mechanical AFM nanolithography. The
 practical assessment of mechanical nanoprobe lithography based on the method of a
 direct surface patterning was carried out during fabrication of functional elements for
 molecular electronics. Polymethine dye nanowires of a specified configuration and the
 cross-section 3×20 nm have been successfully formed in a multilayer
 polytetrafluoroethylene/gold/silicon nanostructure.