Mapping between two models of etching process

• Veröffentlicht in: Condensed Matter Physics
• Datum: 2007
• Hauptverfasser: Patsahan, T., Taleb, A., Stafiej, J., Badiali, J.-P.
• Format: Artikel
• Sprache: Englisch
• Veröffentlicht: Інститут фізики конденсованих систем НАН України 2007
• Online Zugang: https://nasplib.isofts.kiev.ua/handle/123456789/118950
• Назва журналу: Digital Library of Periodicals of National Academy of Sciences of Ukraine
• Zitieren: Mapping between two models of etching process / T. Patsahan, A. Taleb, J. Stafiej, J.-P. Badiali // Condensed Matter Physics. — 2007. — Т. 10, № 4(52). — С. 579-585. — Бібліогр.: 12 назв. — англ.

We consider two models for the etching processes using numerical simulations based on cellular-automata
 discrete-lattice approach. In one model we use a uniform etching probability for each surface site. In another
 model the etching probability at a given site depends on the local...