Investigations of impurity gettering in multicrystalline silicon

The processes of gettering the recombination-active impurities in multicrystalline silicon were investigated using methods of mass spectrometry of neutral atoms with the depth profile analysis and spectroscopy of a surface photovoltage (permitting to determine the diffusion length of non-equilibrium...

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Veröffentlicht in:Semiconductor Physics Quantum Electronics & Optoelectronics
Datum:2001
Hauptverfasser: Evtukh, A.A., Litovchenko, V.G., Oberemok, A.S., Popov, V.G., Rassamakin, Yu.V., Romanyuk, B.N., Volkov, S.G.
Format: Artikel
Sprache:Englisch
Veröffentlicht: Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України 2001
Online Zugang:https://nasplib.isofts.kiev.ua/handle/123456789/119322
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Назва журналу:Digital Library of Periodicals of National Academy of Sciences of Ukraine
Zitieren:Investigations of impurity gettering in multicrystalline silicon / A.A. Evtukh, V.G. Litovchenko, A.S. Oberemok, V.G. Popov, Yu. V. Rassamakin, B.N. Romanyuk, S.G. Volkov // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2001. — Т. 4, № 4. — С. 278-282. — Бібліогр.: 13 назв. — англ.

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Digital Library of Periodicals of National Academy of Sciences of Ukraine
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author Evtukh, A.A.
Litovchenko, V.G.
Oberemok, A.S.
Popov, V.G.
Rassamakin, Yu.V.
Romanyuk, B.N.
Volkov, S.G.
author_facet Evtukh, A.A.
Litovchenko, V.G.
Oberemok, A.S.
Popov, V.G.
Rassamakin, Yu.V.
Romanyuk, B.N.
Volkov, S.G.
citation_txt Investigations of impurity gettering in multicrystalline silicon / A.A. Evtukh, V.G. Litovchenko, A.S. Oberemok, V.G. Popov, Yu. V. Rassamakin, B.N. Romanyuk, S.G. Volkov // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2001. — Т. 4, № 4. — С. 278-282. — Бібліогр.: 13 назв. — англ.
collection DSpace DC
container_title Semiconductor Physics Quantum Electronics & Optoelectronics
description The processes of gettering the recombination-active impurities in multicrystalline silicon were investigated using methods of mass spectrometry of neutral atoms with the depth profile analysis and spectroscopy of a surface photovoltage (permitting to determine the diffusion length of non-equilibrium charge carriers). Getters formed by a silicon layer with a developed internal surface, and also combined getter (the mentioned layer covered with a thin film of aluminum) were used. It was shown that the efficiency of gettering depends on annealing temperature and character of Al depth distribution that, in turn, depends on the regimes of structurally modified silicon layer formation. The models of gettering that enabled us to explain obtained results are considered.
first_indexed 2025-12-07T13:35:19Z
format Article
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institution Digital Library of Periodicals of National Academy of Sciences of Ukraine
issn 1560-8034
language English
last_indexed 2025-12-07T13:35:19Z
publishDate 2001
publisher Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
record_format dspace
spelling Evtukh, A.A.
Litovchenko, V.G.
Oberemok, A.S.
Popov, V.G.
Rassamakin, Yu.V.
Romanyuk, B.N.
Volkov, S.G.
2017-06-06T12:37:03Z
2017-06-06T12:37:03Z
2001
Investigations of impurity gettering in multicrystalline silicon / A.A. Evtukh, V.G. Litovchenko, A.S. Oberemok, V.G. Popov, Yu. V. Rassamakin, B.N. Romanyuk, S.G. Volkov // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2001. — Т. 4, № 4. — С. 278-282. — Бібліогр.: 13 назв. — англ.
1560-8034
PACS: 84. 60. J
https://nasplib.isofts.kiev.ua/handle/123456789/119322
The processes of gettering the recombination-active impurities in multicrystalline silicon were investigated using methods of mass spectrometry of neutral atoms with the depth profile analysis and spectroscopy of a surface photovoltage (permitting to determine the diffusion length of non-equilibrium charge carriers). Getters formed by a silicon layer with a developed internal surface, and also combined getter (the mentioned layer covered with a thin film of aluminum) were used. It was shown that the efficiency of gettering depends on annealing temperature and character of Al depth distribution that, in turn, depends on the regimes of structurally modified silicon layer formation. The models of gettering that enabled us to explain obtained results are considered.
This work was partly supported by the STCU project #U-031.
en
Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
Semiconductor Physics Quantum Electronics & Optoelectronics
Investigations of impurity gettering in multicrystalline silicon
Article
published earlier
spellingShingle Investigations of impurity gettering in multicrystalline silicon
Evtukh, A.A.
Litovchenko, V.G.
Oberemok, A.S.
Popov, V.G.
Rassamakin, Yu.V.
Romanyuk, B.N.
Volkov, S.G.
title Investigations of impurity gettering in multicrystalline silicon
title_full Investigations of impurity gettering in multicrystalline silicon
title_fullStr Investigations of impurity gettering in multicrystalline silicon
title_full_unstemmed Investigations of impurity gettering in multicrystalline silicon
title_short Investigations of impurity gettering in multicrystalline silicon
title_sort investigations of impurity gettering in multicrystalline silicon
url https://nasplib.isofts.kiev.ua/handle/123456789/119322
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