Chemical-mechanical polishing of sapphire by polishing suspension based on aerosil

• Published in: Functional Materials
• Date: 2015
• Main Author: Vovk, E.A.
• Format: Article
• Language: English
• Published: НТК «Інститут монокристалів» НАН України 2015
• Subjects: Technology
• Online Access: https://nasplib.isofts.kiev.ua/handle/123456789/119359
• Journal Title: Digital Library of Periodicals of National Academy of Sciences of Ukraine
• Cite this: Chemical-mechanical polishing of sapphire by polishing suspension based on aerosil / E.A.Vovk // Functional Materials. — 2015. — Т. 22, № 2. — С. 252-257. — Бібліогр.: 13 назв. — англ.

The conditions for the optimal balance among the degree of agglomeration of aerosil in the polishing suspension, removal rate, and the quality of the polished sapphire surface under chemical-mechanical polishing (CMP) with the polishing suspension contained surfactants at different pH were determine...