Mass-spectrometric investigations of gas evolution

Method of mass-spectrometry with time-of-flight recording of the desorbed products was used to study the gas evolution of impurities from the subsurface layer of Si crystals molten by the electron beam (of ~2 mm² area) in the vacuum of 10⁻⁵ – 10⁻⁷ Pa. It is shown that irrespective of vacuum level, o...

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Veröffentlicht in:Semiconductor Physics Quantum Electronics & Optoelectronics
Datum:2006
Hauptverfasser: Asnis, Yu.A., Baranskii, P.I., Babich, V.M., Zabolotin, S.P., Ptushinskii, Yu.G., Sukretnyi, V.G.
Format: Artikel
Sprache:Englisch
Veröffentlicht: Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України 2006
Online Zugang:https://nasplib.isofts.kiev.ua/handle/123456789/121441
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Zitieren:Mass-spectrometric investigations of gas evolution / Yu.A. Asnis, P.I. Baranskii, V.M. Babich, S.P. Zabolotin, Yu.G. Ptushinskii, V.G. Sukretnyi // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2006. — Т. 9, № 2. — С. 4-7. — Бібліогр.: 6 назв. — англ.

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Digital Library of Periodicals of National Academy of Sciences of Ukraine
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author Asnis, Yu.A.
Baranskii, P.I.
Babich, V.M.
Zabolotin, S.P.
Ptushinskii, Yu.G.
Sukretnyi, V.G.
author_facet Asnis, Yu.A.
Baranskii, P.I.
Babich, V.M.
Zabolotin, S.P.
Ptushinskii, Yu.G.
Sukretnyi, V.G.
citation_txt Mass-spectrometric investigations of gas evolution / Yu.A. Asnis, P.I. Baranskii, V.M. Babich, S.P. Zabolotin, Yu.G. Ptushinskii, V.G. Sukretnyi // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2006. — Т. 9, № 2. — С. 4-7. — Бібліогр.: 6 назв. — англ.
collection DSpace DC
container_title Semiconductor Physics Quantum Electronics & Optoelectronics
description Method of mass-spectrometry with time-of-flight recording of the desorbed products was used to study the gas evolution of impurities from the subsurface layer of Si crystals molten by the electron beam (of ~2 mm² area) in the vacuum of 10⁻⁵ – 10⁻⁷ Pa. It is shown that irrespective of vacuum level, oxygen (m = 32) and hydrogen (m = 2) in the molecular state as well as Si atoms (m = 28) are registered as the main components of gas evolution in the mass-spectrum in melting. With longer time of the subsurface layer exposure in the molten state, an indication of CO evolution (fragment peak m = 12) appears in the mass-spectrum. There is, however, a ground to believe that this is the consequence of gas evolution from the fixtures, and not from the Si sample. Features of gas evolution were revealed at the initial stage of heating and melting of Si sample, depending on the previous heat-treatment of the sample. If melting the subsurface zone proceeds after contact with the atmosphere, initial peaks of evolution of oxygen and hydrogen molecules and Si atoms are observed. These are partially weakened with further keeping the sample in the molten state. In our opinion, such a peak is due to contamination of the surface at such a contact. A long-term exposure in vacuum of a sample cooled after melting does not lead to appearance of the above peak at subsequent melting.
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language English
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publishDate 2006
publisher Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
record_format dspace
spelling Asnis, Yu.A.
Baranskii, P.I.
Babich, V.M.
Zabolotin, S.P.
Ptushinskii, Yu.G.
Sukretnyi, V.G.
2017-06-14T11:04:17Z
2017-06-14T11:04:17Z
2006
Mass-spectrometric investigations of gas evolution / Yu.A. Asnis, P.I. Baranskii, V.M. Babich, S.P. Zabolotin, Yu.G. Ptushinskii, V.G. Sukretnyi // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2006. — Т. 9, № 2. — С. 4-7. — Бібліогр.: 6 назв. — англ.
1560-8034
PACS 81.05.Cy
https://nasplib.isofts.kiev.ua/handle/123456789/121441
Method of mass-spectrometry with time-of-flight recording of the desorbed products was used to study the gas evolution of impurities from the subsurface layer of Si crystals molten by the electron beam (of ~2 mm² area) in the vacuum of 10⁻⁵ – 10⁻⁷ Pa. It is shown that irrespective of vacuum level, oxygen (m = 32) and hydrogen (m = 2) in the molecular state as well as Si atoms (m = 28) are registered as the main components of gas evolution in the mass-spectrum in melting. With longer time of the subsurface layer exposure in the molten state, an indication of CO evolution (fragment peak m = 12) appears in the mass-spectrum. There is, however, a ground to believe that this is the consequence of gas evolution from the fixtures, and not from the Si sample. Features of gas evolution were revealed at the initial stage of heating and melting of Si sample, depending on the previous heat-treatment of the sample. If melting the subsurface zone proceeds after contact with the atmosphere, initial peaks of evolution of oxygen and hydrogen molecules and Si atoms are observed. These are partially weakened with further keeping the sample in the molten state. In our opinion, such a peak is due to contamination of the surface at such a contact. A long-term exposure in vacuum of a sample cooled after melting does not lead to appearance of the above peak at subsequent melting.
en
Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
Semiconductor Physics Quantum Electronics & Optoelectronics
Mass-spectrometric investigations of gas evolution
Article
published earlier
spellingShingle Mass-spectrometric investigations of gas evolution
Asnis, Yu.A.
Baranskii, P.I.
Babich, V.M.
Zabolotin, S.P.
Ptushinskii, Yu.G.
Sukretnyi, V.G.
title Mass-spectrometric investigations of gas evolution
title_full Mass-spectrometric investigations of gas evolution
title_fullStr Mass-spectrometric investigations of gas evolution
title_full_unstemmed Mass-spectrometric investigations of gas evolution
title_short Mass-spectrometric investigations of gas evolution
title_sort mass-spectrometric investigations of gas evolution
url https://nasplib.isofts.kiev.ua/handle/123456789/121441
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AT ptushinskiiyug massspectrometricinvestigationsofgasevolution
AT sukretnyivg massspectrometricinvestigationsofgasevolution