Electrical and optical parameters of Cu₆PS₅I-based thin films deposited using magnetron sputtering

Cu₆PS₅I-based thin films were deposited onto silicate glass substrates by nonreactive radio-frequency magnetron sputtering. The chemical composition of thin films was determined using energy-dispersive X-ray spectroscopy. Electrical conductivity of Cu₆PS₅I-based thin films was studied as dependent o...

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Veröffentlicht in:Semiconductor Physics Quantum Electronics & Optoelectronics
Datum:2016
Hauptverfasser: Studenyak, I.P., Bendak, A.V., Izai, V.Yu., Guranich, P.P., Kúš, P., Mikula, M., Grančič, B., Zahoran, M., Greguš, J., Vincze, A., Roch, T., Plecenik, T.
Format: Artikel
Sprache:English
Veröffentlicht: Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України 2016
Online Zugang:https://nasplib.isofts.kiev.ua/handle/123456789/121529
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Назва журналу:Digital Library of Periodicals of National Academy of Sciences of Ukraine
Zitieren:Electrical and optical parameters of Cu₆PS₅I-based thin films deposited using magnetron sputtering / I.P. Studenyak, A.V. Bendak, V.Yu. Izai, P.P. Guranich, P. Kúš, M. Mikula, B. Grančič, M. Zahoran, J. Greguš, A. Vincze, T. Roch, T. Plecenik // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2016. — Т. 19, № 1. — С. 79-83. — Бібліогр.: 17 назв. — англ.

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