Theoretical and experimental modelling the specific resistance of vertical ohmic contacts Au–Ti–Pd–n⁺-n-n⁺-Si in IMPATT diodes

The method of electrophysical diagnostic of n⁺-n-n⁺ structures at the etching stage of manufacturing process of power IMPATT diodes has been proposed. A numerical method for specific contacts resistance calculation of vertical ohmic contacts with a non-uniform doping level has been developed. Vertic...

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Опубліковано в: :Semiconductor Physics Quantum Electronics & Optoelectronics
Дата:2016
Автори: Romanets, P.M., Belyaev, A.E., Sachenko, А.V., Boltovets, N.S., Basanets, V.V., Konakova, R.V., Slipokurov, V.S., Khodin, А.А., Pilipenko, V.А., Shynkarenko, V.V., Kudryk, Ya.Ya.
Формат: Стаття
Мова:English
Опубліковано: Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України 2016
Онлайн доступ:https://nasplib.isofts.kiev.ua/handle/123456789/121657
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Назва журналу:Digital Library of Periodicals of National Academy of Sciences of Ukraine
Цитувати:Theoretical and experimental modelling the specific resistance of vertical ohmic contacts Au–Ti–Pd–n⁺-n-n⁺-Si in IMPATT diodes / P.M. Romanets, A.E. Belyaev, А.V. Sachenko, N.S. Boltovets, V.V. Basanets, R.V. Konakova, V.S. Slipokurov, А.А. Khodin, V.А. Pilipenko, V.V. Shynkarenko, Ya.Ya. Kudryk // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2016. — Т. 19, № 4. — С. 366-370. — Бібліогр.: 9 назв. — англ.

Репозитарії

Digital Library of Periodicals of National Academy of Sciences of Ukraine
id nasplib_isofts_kiev_ua-123456789-121657
record_format dspace
spelling Romanets, P.M.
Belyaev, A.E.
Sachenko, А.V.
Boltovets, N.S.
Basanets, V.V.
Konakova, R.V.
Slipokurov, V.S.
Khodin, А.А.
Pilipenko, V.А.
Shynkarenko, V.V.
Kudryk, Ya.Ya.
2017-06-15T08:19:15Z
2017-06-15T08:19:15Z
2016
Theoretical and experimental modelling the specific resistance of vertical ohmic contacts Au–Ti–Pd–n⁺-n-n⁺-Si in IMPATT diodes / P.M. Romanets, A.E. Belyaev, А.V. Sachenko, N.S. Boltovets, V.V. Basanets, R.V. Konakova, V.S. Slipokurov, А.А. Khodin, V.А. Pilipenko, V.V. Shynkarenko, Ya.Ya. Kudryk // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2016. — Т. 19, № 4. — С. 366-370. — Бібліогр.: 9 назв. — англ.
1560-8034
: 10.15407/spqeo19.04.366
PACS 73.40.Ns, 85.30.Kk
https://nasplib.isofts.kiev.ua/handle/123456789/121657
The method of electrophysical diagnostic of n⁺-n-n⁺ structures at the etching stage of manufacturing process of power IMPATT diodes has been proposed. A numerical method for specific contacts resistance calculation of vertical ohmic contacts with a non-uniform doping level has been developed. Vertical ohmic contacts Au–Ti–Pd–n⁺-n-n⁺-Si both before and after etching were used for experimental checking this model. It has been computed the value of contact resistance in the interface metal–n⁺ with correction of contribution of n⁺-n and n-n⁺ resistances to the total resistance. The values of total effective resistances of vertical ohmic contacts Au–Ti–Pd–n⁺-n-n⁺-Si may be calculated using the Cox–Strack method. We used solutions of Laplace’s equation for computation of specific contact resistance metal–n⁺ without contribution of interfaces n⁺-n and n-n⁺. The values of specific contact resistance were ~10⁻⁶ Ohm·cm². This method allows to control the manufacture process by monitoring the changes in electrophysical properties of the structure between etching cycles.
Publications are based on the research provided by the grant support of the State Fund For Fundamental Research (project Ф73/118-2016).
en
Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
Semiconductor Physics Quantum Electronics & Optoelectronics
Theoretical and experimental modelling the specific resistance of vertical ohmic contacts Au–Ti–Pd–n⁺-n-n⁺-Si in IMPATT diodes
Article
published earlier
institution Digital Library of Periodicals of National Academy of Sciences of Ukraine
collection DSpace DC
title Theoretical and experimental modelling the specific resistance of vertical ohmic contacts Au–Ti–Pd–n⁺-n-n⁺-Si in IMPATT diodes
spellingShingle Theoretical and experimental modelling the specific resistance of vertical ohmic contacts Au–Ti–Pd–n⁺-n-n⁺-Si in IMPATT diodes
Romanets, P.M.
Belyaev, A.E.
Sachenko, А.V.
Boltovets, N.S.
Basanets, V.V.
Konakova, R.V.
Slipokurov, V.S.
Khodin, А.А.
Pilipenko, V.А.
Shynkarenko, V.V.
Kudryk, Ya.Ya.
title_short Theoretical and experimental modelling the specific resistance of vertical ohmic contacts Au–Ti–Pd–n⁺-n-n⁺-Si in IMPATT diodes
title_full Theoretical and experimental modelling the specific resistance of vertical ohmic contacts Au–Ti–Pd–n⁺-n-n⁺-Si in IMPATT diodes
title_fullStr Theoretical and experimental modelling the specific resistance of vertical ohmic contacts Au–Ti–Pd–n⁺-n-n⁺-Si in IMPATT diodes
title_full_unstemmed Theoretical and experimental modelling the specific resistance of vertical ohmic contacts Au–Ti–Pd–n⁺-n-n⁺-Si in IMPATT diodes
title_sort theoretical and experimental modelling the specific resistance of vertical ohmic contacts au–ti–pd–n⁺-n-n⁺-si in impatt diodes
author Romanets, P.M.
Belyaev, A.E.
Sachenko, А.V.
Boltovets, N.S.
Basanets, V.V.
Konakova, R.V.
Slipokurov, V.S.
Khodin, А.А.
Pilipenko, V.А.
Shynkarenko, V.V.
Kudryk, Ya.Ya.
author_facet Romanets, P.M.
Belyaev, A.E.
Sachenko, А.V.
Boltovets, N.S.
Basanets, V.V.
Konakova, R.V.
Slipokurov, V.S.
Khodin, А.А.
Pilipenko, V.А.
Shynkarenko, V.V.
Kudryk, Ya.Ya.
publishDate 2016
language English
container_title Semiconductor Physics Quantum Electronics & Optoelectronics
publisher Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
format Article
description The method of electrophysical diagnostic of n⁺-n-n⁺ structures at the etching stage of manufacturing process of power IMPATT diodes has been proposed. A numerical method for specific contacts resistance calculation of vertical ohmic contacts with a non-uniform doping level has been developed. Vertical ohmic contacts Au–Ti–Pd–n⁺-n-n⁺-Si both before and after etching were used for experimental checking this model. It has been computed the value of contact resistance in the interface metal–n⁺ with correction of contribution of n⁺-n and n-n⁺ resistances to the total resistance. The values of total effective resistances of vertical ohmic contacts Au–Ti–Pd–n⁺-n-n⁺-Si may be calculated using the Cox–Strack method. We used solutions of Laplace’s equation for computation of specific contact resistance metal–n⁺ without contribution of interfaces n⁺-n and n-n⁺. The values of specific contact resistance were ~10⁻⁶ Ohm·cm². This method allows to control the manufacture process by monitoring the changes in electrophysical properties of the structure between etching cycles.
issn 1560-8034
url https://nasplib.isofts.kiev.ua/handle/123456789/121657
citation_txt Theoretical and experimental modelling the specific resistance of vertical ohmic contacts Au–Ti–Pd–n⁺-n-n⁺-Si in IMPATT diodes / P.M. Romanets, A.E. Belyaev, А.V. Sachenko, N.S. Boltovets, V.V. Basanets, R.V. Konakova, V.S. Slipokurov, А.А. Khodin, V.А. Pilipenko, V.V. Shynkarenko, Ya.Ya. Kudryk // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2016. — Т. 19, № 4. — С. 366-370. — Бібліогр.: 9 назв. — англ.
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