Comparative investigation of NbN and Nb–Si–N films: experiment and theory

NbN and Nb–Si–N films have been deposited by magnetron sputtering of the Nb and Si targets on silicon wafers at various powers supplied to the Nb target. The films have been investigated by an atomic force microscope, X-ray diffraction, X-ray photoelectron spectroscopy, nanoindentaion and microinden...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Datum:2014
Hauptverfasser: Ivashchenko, V.I., Scrynskyy, P.L., Lytvyn, O.S., Butenko, O.O., Sinelnichenko, O.K., Gorb, L., Hill, F., Leszczynski, J., Kozak, A.O.
Format: Artikel
Sprache:English
Veröffentlicht: Інститут надтвердих матеріалів ім. В.М. Бакуля НАН України 2014
Schriftenreihe:Сверхтвердые материалы
Schlagworte:
Online Zugang:https://nasplib.isofts.kiev.ua/handle/123456789/126127
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Назва журналу:Digital Library of Periodicals of National Academy of Sciences of Ukraine
Zitieren:Comparative investigation of NbN and Nb–Si–N films: experiment and theory / V.I. Ivashchenko, P.L. Scrynskyy, O.S. Lytvyn, O.O. Butenko, O.K. Sinelnichenko, L. Gorb, F. Hill, J. Leszczynski, A.O. Kozak // Сверхтвердые материалы. — 2014. — № 6. — С. 29-43. — Бібліогр.: 37 назв. — англ.

Institution

Digital Library of Periodicals of National Academy of Sciences of Ukraine