Comparative investigation of NbN and Nb–Si–N films: experiment and theory

• Veröffentlicht in: Сверхтвердые материалы
• Datum: 2014
• Hauptverfasser: Ivashchenko, V.I., Scrynskyy, P.L., Lytvyn, O.S., Butenko, O.O., Sinelnichenko, O.K., Gorb, L., Hill, F., Leszczynski, J., Kozak, A.O.
• Format: Artikel
• Sprache: English
• Veröffentlicht: Інститут надтвердих матеріалів ім. В.М. Бакуля НАН України 2014
• Schlagworte: Получение, структура, свойства
• Online Zugang: https://nasplib.isofts.kiev.ua/handle/123456789/126127
• Назва журналу: Digital Library of Periodicals of National Academy of Sciences of Ukraine
• Zitieren: Comparative investigation of NbN and Nb–Si–N films: experiment and theory / V.I. Ivashchenko, P.L. Scrynskyy, O.S. Lytvyn, O.O. Butenko, O.K. Sinelnichenko, L. Gorb, F. Hill, J. Leszczynski, A.O. Kozak // Сверхтвердые материалы. — 2014. — № 6. — С. 29-43. — Бібліогр.: 37 назв. — англ.

NbN and Nb–Si–N films have been deposited by magnetron sputtering of the Nb and Si targets on silicon wafers at various powers supplied to the Nb target. The films have been investigated by an atomic force microscope, X-ray diffraction, X-ray photoelectron spectroscopy, nanoindentaion and microinden...