Characterization of Ti–B–C–N films deposited by dc magnetron sputtering of bicomponent Ti/B₄C target

• Published in: Сверхтвердые материалы
• Date: 2015
• Main Authors: Onoprienko, A.A., Ivashchenko, V.I., Timofeeva, I.I., Sinelnitchenko, А.К., Butenko, О.А.
• Format: Article
• Language: English
• Published: Інститут надтвердих матеріалів ім. В.М. Бакуля НАН України 2015
• Subjects: Получение, структура, свойства
• Online Access: https://nasplib.isofts.kiev.ua/handle/123456789/126147
• Journal Title: Digital Library of Periodicals of National Academy of Sciences of Ukraine
• Cite this: Characterization of Ti–B–C–N films deposited by dc magnetron sputtering of bicomponent Ti/B₄C target / A.A. Onoprienko, V.I. Ivashchenko, I.I. Timofeeva, А.К. Sinelnitchenko, О.А. Butenko // Сверхтвердые материалы. — 2015. — № 1. — С. 21-29. — Бібліогр.: 23 назв. — англ.

Quaternary Ti–B–C–N films have been deposited onto Si (100) substrates by dc magnetron sputtering of bi-component Ti/B₄C target in an Ar/N₂ gas mixture with different amounts of nitrogen in the mixture (from 0 to 50%). The X-ray diffraction, X-ray photoelectron spectroscopy, indentation, and scratch...