Characterization of Ti–B–C–N films deposited by dc magnetron sputtering of bicomponent Ti/B₄C target
Quaternary Ti–B–C–N films have been deposited onto Si (100) substrates by dc magnetron sputtering of bi-component Ti/B₄C target in an Ar/N₂ gas mixture with different amounts of nitrogen in the mixture (from 0 to 50%). The X-ray diffraction, X-ray photoelectron spectroscopy, indentation, and scratch...
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| Veröffentlicht in: | Сверхтвердые материалы |
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| Datum: | 2015 |
| Hauptverfasser: | , , , , |
| Format: | Artikel |
| Sprache: | English |
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Інститут надтвердих матеріалів ім. В.М. Бакуля НАН України
2015
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| Online Zugang: | https://nasplib.isofts.kiev.ua/handle/123456789/126147 |
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| Назва журналу: | Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| Zitieren: | Characterization of Ti–B–C–N films deposited by dc magnetron sputtering of bicomponent Ti/B₄C target / A.A. Onoprienko, V.I. Ivashchenko, I.I. Timofeeva, А.К. Sinelnitchenko, О.А. Butenko // Сверхтвердые материалы. — 2015. — № 1. — С. 21-29. — Бібліогр.: 23 назв. — англ. |