Electrodeposition of copper indium diselenide films using pulse plating technique

• Published in: Functional Materials
• Date: 2007
• Main Author: Klochko, N.P.
• Format: Article
• Language: English
• Published: НТК «Інститут монокристалів» НАН України 2007
• Online Access: https://nasplib.isofts.kiev.ua/handle/123456789/136990
• Journal Title: Digital Library of Periodicals of National Academy of Sciences of Ukraine
• Cite this: Electrodeposition of copper indium diselenide films using pulse plating technique / N.P. Klochko // Functional Materials. — 2007. — Т. 14, № 3. — С. 343-346. — Бібліогр.: 9 назв. — англ.

Parameters of rectangular potential pulse electolysis wich have provided the obtaining of nearly stoichiometric copper indium diselenide layers have been selected using the examination of those films by energy-dispersive X-ray spectroscopy, anodic stripping, scanning electron microscopy and the film...