Initial stages of diffusion and phase formation in Sc/Si layered systems

Kinetics of phase formation Sc/Si multilayers and Si/Sc/Si three-layers within the temperature range of 130-400°C has been studied by cross-sectional transmission electron microscopy and small-angle X-ray reflectometry. Growth of ScSi silicide governed by diffusion kinetics was observed at all tempe...

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Опубліковано в: :Functional Materials
Дата:2008
Автори: Voronov, D.L., Zubarev, E.N., Kondratenko, V.V., Pershun, Yu.P., Sevryukova, V.A., Bugayev, Ye.A.
Формат: Стаття
Мова:Англійська
Опубліковано: НТК «Інститут монокристалів» НАН України 2008
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Онлайн доступ:https://nasplib.isofts.kiev.ua/handle/123456789/137250
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Назва журналу:Digital Library of Periodicals of National Academy of Sciences of Ukraine
Цитувати:Initial stages of diffusion and phase formation in Sc/Si layered systems / D.L. Voronov, E.N. Zubarev, V.V. Kondratenko, Yu.P. Pershun, V.A. Sevryukova, Ye.A. Bugayev // Functional Materials. — 2008. — Т. 15, № 1. — С. 30-37. — Бібліогр.: 23 назв. — англ.

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Digital Library of Periodicals of National Academy of Sciences of Ukraine
_version_ 1862738403505733632
author Voronov, D.L.
Zubarev, E.N.
Kondratenko, V.V.
Pershun, Yu.P.
Sevryukova, V.A.
Bugayev, Ye.A.
author_facet Voronov, D.L.
Zubarev, E.N.
Kondratenko, V.V.
Pershun, Yu.P.
Sevryukova, V.A.
Bugayev, Ye.A.
citation_txt Initial stages of diffusion and phase formation in Sc/Si layered systems / D.L. Voronov, E.N. Zubarev, V.V. Kondratenko, Yu.P. Pershun, V.A. Sevryukova, Ye.A. Bugayev // Functional Materials. — 2008. — Т. 15, № 1. — С. 30-37. — Бібліогр.: 23 назв. — англ.
collection DSpace DC
container_title Functional Materials
description Kinetics of phase formation Sc/Si multilayers and Si/Sc/Si three-layers within the temperature range of 130-400°C has been studied by cross-sectional transmission electron microscopy and small-angle X-ray reflectometry. Growth of ScSi silicide governed by diffusion kinetics was observed at all temperatures. Two growth stages of nonparabolic and parabolic behavior were revealed. Initial nonparabolic stage is characterized by higher diffusion coefficient, which decreases during annealing in 20 times due to silicide structural relaxation. After annihilation of excess free volume a transition to parabolic growth takes place. Parameters of interdiffusion (activation energy E ≈1 eV and pre-exponential factor D₀ = 4.10⁻¹² m²s⁻¹) were determined for parabolic growth stage.
first_indexed 2025-12-07T20:03:52Z
format Article
fulltext
id nasplib_isofts_kiev_ua-123456789-137250
institution Digital Library of Periodicals of National Academy of Sciences of Ukraine
issn 1027-5495
language English
last_indexed 2025-12-07T20:03:52Z
publishDate 2008
publisher НТК «Інститут монокристалів» НАН України
record_format dspace
spelling Voronov, D.L.
Zubarev, E.N.
Kondratenko, V.V.
Pershun, Yu.P.
Sevryukova, V.A.
Bugayev, Ye.A.
2018-06-17T09:21:01Z
2018-06-17T09:21:01Z
2008
Initial stages of diffusion and phase formation in Sc/Si layered systems / D.L. Voronov, E.N. Zubarev, V.V. Kondratenko, Yu.P. Pershun, V.A. Sevryukova, Ye.A. Bugayev // Functional Materials. — 2008. — Т. 15, № 1. — С. 30-37. — Бібліогр.: 23 назв. — англ.
1027-5495
https://nasplib.isofts.kiev.ua/handle/123456789/137250
Kinetics of phase formation Sc/Si multilayers and Si/Sc/Si three-layers within the temperature range of 130-400°C has been studied by cross-sectional transmission electron microscopy and small-angle X-ray reflectometry. Growth of ScSi silicide governed by diffusion kinetics was observed at all temperatures. Two growth stages of nonparabolic and parabolic behavior were revealed. Initial nonparabolic stage is characterized by higher diffusion coefficient, which decreases during annealing in 20 times due to silicide structural relaxation. After annihilation of excess free volume a transition to parabolic growth takes place. Parameters of interdiffusion (activation energy E ≈1 eV and pre-exponential factor D₀ = 4.10⁻¹² m²s⁻¹) were determined for parabolic growth stage.
en
НТК «Інститут монокристалів» НАН України
Functional Materials
Characterization and properties
Initial stages of diffusion and phase formation in Sc/Si layered systems
Початкові стадії дифузії і фазоутворення в шаруватих системах Sc/Si
Article
published earlier
spellingShingle Initial stages of diffusion and phase formation in Sc/Si layered systems
Voronov, D.L.
Zubarev, E.N.
Kondratenko, V.V.
Pershun, Yu.P.
Sevryukova, V.A.
Bugayev, Ye.A.
Characterization and properties
title Initial stages of diffusion and phase formation in Sc/Si layered systems
title_alt Початкові стадії дифузії і фазоутворення в шаруватих системах Sc/Si
title_full Initial stages of diffusion and phase formation in Sc/Si layered systems
title_fullStr Initial stages of diffusion and phase formation in Sc/Si layered systems
title_full_unstemmed Initial stages of diffusion and phase formation in Sc/Si layered systems
title_short Initial stages of diffusion and phase formation in Sc/Si layered systems
title_sort initial stages of diffusion and phase formation in sc/si layered systems
topic Characterization and properties
topic_facet Characterization and properties
url https://nasplib.isofts.kiev.ua/handle/123456789/137250
work_keys_str_mv AT voronovdl initialstagesofdiffusionandphaseformationinscsilayeredsystems
AT zubareven initialstagesofdiffusionandphaseformationinscsilayeredsystems
AT kondratenkovv initialstagesofdiffusionandphaseformationinscsilayeredsystems
AT pershunyup initialstagesofdiffusionandphaseformationinscsilayeredsystems
AT sevryukovava initialstagesofdiffusionandphaseformationinscsilayeredsystems
AT bugayevyea initialstagesofdiffusionandphaseformationinscsilayeredsystems
AT voronovdl počatkovístadíídifuzííífazoutvorennâvšaruvatihsistemahscsi
AT zubareven počatkovístadíídifuzííífazoutvorennâvšaruvatihsistemahscsi
AT kondratenkovv počatkovístadíídifuzííífazoutvorennâvšaruvatihsistemahscsi
AT pershunyup počatkovístadíídifuzííífazoutvorennâvšaruvatihsistemahscsi
AT sevryukovava počatkovístadíídifuzííífazoutvorennâvšaruvatihsistemahscsi
AT bugayevyea počatkovístadíídifuzííífazoutvorennâvšaruvatihsistemahscsi