Influence of Si on microstructure and mechanical properties of TiAISiN hard thin films

Structural and mechanical properties of nanocomposite TiAI(Si)N thin films prepared using arc-plasma PVD deposition technique on WC-Co substrates have been characterized by X-ray diffraction and nanoindentation. TEM have been used to study the microstructure of thin films, in order to understand the...

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Datum:2004
Hauptverfasser: Nakonechna, O.I., Zakharenko, M.I.
Format: Artikel
Sprache:English
Veröffentlicht: НТК «Інститут монокристалів» НАН України 2004
Schriftenreihe:Functional Materials
Online Zugang:https://nasplib.isofts.kiev.ua/handle/123456789/139468
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Назва журналу:Digital Library of Periodicals of National Academy of Sciences of Ukraine
Zitieren:Influence of Si on microstructure and mechanical properties of TiAISiN hard thin films / O.I. Nakonechna, M.I. Zakharenko // Functional Materials. — 2004. — Т. 11, № 3. — С. 541-545. — Бібліогр.: 17 назв. — англ.

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