Phase formation and crystallization of films deposited by pulse laser sputtering of chromium in oxygen atmosphere

Effects of the substrate temperature Tₛ (20-420 ℃) and the oxygen pressure in the evaporation chamber Р(О₂) (10⁻⁵-10⁻² Torr) on the structure and phase composition of films obtained by pulse laser sputtering of a chromium target have been studied by electron microscopy (using the...

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Published in:Functional Materials
Date:2006
Main Authors: Bagmut, A.G., Grigorov, S.N., Zhuchkov, V.A., Kolosov, V.Yu., Kosevich, V.M., Nikolaichuk, G.P.
Format: Article
Language:English
Published: НТК «Інститут монокристалів» НАН України 2006
Online Access:https://nasplib.isofts.kiev.ua/handle/123456789/140069
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Journal Title:Digital Library of Periodicals of National Academy of Sciences of Ukraine
Cite this:Phase formation and crystallization of films deposited by pulse laser sputtering of chromium in oxygen atmosphere / A.G. Bagmut, S.N. Grigorov, V.A. Zhuchkov, V.Yu. Kolosov, V.M. Kosevich, G.P. Nikolaichuk // Functional Materials. — 2006. — Т. 13, № 2. — С. 206-213. — Бібліогр.: 8 назв. — англ.

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Digital Library of Periodicals of National Academy of Sciences of Ukraine