Deposition and characterization of thin Si–B–C–N films by dc reactive magnetron sputtering of composed Si/B₄C target

• Veröffentlicht in: Сверхтвердые материалы
• Datum: 2019
• Hauptverfasser: Onoprienko, A.A., Ivashchenko, V.I., Kozak, A.O., Sinelnichenko, A.K., Tomila, T.V.
• Format: Artikel
• Sprache: English
• Veröffentlicht: Інститут надтвердих матеріалів ім. В.М. Бакуля НАН України 2019
• Schlagworte: Одержання, структура, властивості
• Online Zugang: https://nasplib.isofts.kiev.ua/handle/123456789/167298
• Назва журналу: Digital Library of Periodicals of National Academy of Sciences of Ukraine
• Zitieren: Deposition and characterization of thin Si–B–C–N films by dc reactive magnetron sputtering of composed Si/B₄C target / A.A. Onoprienko, V.I. Ivashchenko, A.O. Kozak, A.K. Sinelnichenko, T.V. Tomila // Надтверді матеріали. — 2019. — № 2 (238). — С. 29-38. — Бібліогр.: 34 назв. — англ.

The effect of the gas mixture composition on the structure, chemical bond character and hardness of Si–B–C–N films was systematically studied. A series of Si–B–C–N films was deposited by reactive dc magnetron sputtering of the target composed of Si disc with B₄C chips placed in the sputtering zone o...