Ion-plasma deposition of thin quasicrystalline Al-Cu-Fe and Al-Cu-Co films
Al-Cu-Fe and Al-Co-Cu thin films were firstly deposited on sodium chloride or glass-ceramic substrates by modernized method of three-electrode ion-plasma sputtering. The nominal compositions of the films were chosen in the regions of quasicrystalline phases formation. The as-sputtered films were typ...
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| Date: | 2020 |
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| Main Authors: | , |
| Format: | Article |
| Language: | English |
| Published: |
Національний науковий центр «Харківський фізико-технічний інститут» НАН України
2020
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| Series: | Вопросы атомной науки и техники |
| Subjects: | |
| Online Access: | https://nasplib.isofts.kiev.ua/handle/123456789/194377 |
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| Journal Title: | Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| Cite this: | Ion-plasma deposition of thin quasicrystalline Al-Cu-Fe and Al-Cu-Co films / S.I. Ryabtsev, O.V. Sukhova // Problems of atomic science and tecnology. — 2020. — № 2. — С. 145-150. — Бібліогр.: 32 назв. — англ. |