Fomin, A., Pashchenko, G., Kravetskyi, M., & Lutsyshyn, I. (2017). Model of smoothing roughness on GaAs wafer surface by using nonabrasive chemical-and-mechanical polishing. Semiconductor Physics Quantum Electronics & Optoelectronics.
Chicago Style (17th ed.) CitationFomin, A.V, G.A Pashchenko, M.Yu Kravetskyi, and I.G Lutsyshyn. "Model of Smoothing Roughness on GaAs Wafer Surface by Using Nonabrasive Chemical-and-mechanical Polishing." Semiconductor Physics Quantum Electronics & Optoelectronics 2017.
MLA (8th ed.) CitationFomin, A.V, et al. "Model of Smoothing Roughness on GaAs Wafer Surface by Using Nonabrasive Chemical-and-mechanical Polishing." Semiconductor Physics Quantum Electronics & Optoelectronics, 2017.
Warning: These citations may not always be 100% accurate.