The influence of ethylene glycol on the chemical interaction of PbTe and Pb₁₋ₓSnₓTe crystals with H₂O₂–HBr–ethylene glycol etching compositions
The process of cutting, mechanical and chemical treatment of the PbTe and Pb₁₋ₓSnₓTe crystal surface has been studied. The dependences of the chemical-mechanical polishing rate versus dilution of the base polishing etchant H₂O₂–HBr–ethylene glycol by the ethylene glycol have been determined. The sur...
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| Veröffentlicht in: | Semiconductor Physics Quantum Electronics & Optoelectronics |
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| Datum: | 2017 |
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| Format: | Artikel |
| Sprache: | Englisch |
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Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
2017
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| Online Zugang: | https://nasplib.isofts.kiev.ua/handle/123456789/214906 |
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| Назва журналу: | Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| Zitieren: | The influence of ethylene glycol on the chemical interaction of PbTe and Pb₁₋ₓSnₓTe crystals with H₂O₂–HBr–ethylene glycol etching compositions / G.P. Malanych, V.M. Tomashyk, O.S. Lytvyn // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2017. — Т. 20, № 1. — С. 91-95. — Бібліогр.: 10 назв. — англ. |
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Digital Library of Periodicals of National Academy of Sciences of Ukraine| _version_ | 1862724929906016256 |
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| author | Malanych, G.P. Tomashyk, V.M. Lytvyn, O.S. |
| author_facet | Malanych, G.P. Tomashyk, V.M. Lytvyn, O.S. |
| citation_txt | The influence of ethylene glycol on the chemical interaction of PbTe and Pb₁₋ₓSnₓTe crystals with H₂O₂–HBr–ethylene glycol etching compositions / G.P. Malanych, V.M. Tomashyk, O.S. Lytvyn // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2017. — Т. 20, № 1. — С. 91-95. — Бібліогр.: 10 назв. — англ. |
| collection | DSpace DC |
| container_title | Semiconductor Physics Quantum Electronics & Optoelectronics |
| description | The process of cutting, mechanical and chemical treatment of the PbTe and Pb₁₋ₓSnₓTe crystal surface has been studied. The dependences of the chemical-mechanical polishing rate versus dilution of the base polishing etchant H₂O₂–HBr–ethylene glycol by the ethylene glycol have been determined. The surface states after chemical etching have been investigated using electron, metallographic, and atomic force microscopy, as well as X-ray microanalysis. It has been shown that the surface state is improved after chemical etching. Efficient methods for washing the samples after different types of PbTe and Pb₁₋ₓSnₓTe surface treatment (cutting the crystal, mechanical surface treatment, and chemical removal of the surface-damaged layer) have been developed.
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| first_indexed | 2026-03-21T07:43:30Z |
| format | Article |
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| id | nasplib_isofts_kiev_ua-123456789-214906 |
| institution | Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| issn | 1560-8034 |
| language | English |
| last_indexed | 2026-03-21T07:43:30Z |
| publishDate | 2017 |
| publisher | Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України |
| record_format | dspace |
| spelling | Malanych, G.P. Tomashyk, V.M. Lytvyn, O.S. 2026-03-03T11:04:48Z 2017 The influence of ethylene glycol on the chemical interaction of PbTe and Pb₁₋ₓSnₓTe crystals with H₂O₂–HBr–ethylene glycol etching compositions / G.P. Malanych, V.M. Tomashyk, O.S. Lytvyn // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2017. — Т. 20, № 1. — С. 91-95. — Бібліогр.: 10 назв. — англ. 1560-8034 PACS: 81.65.Ps https://nasplib.isofts.kiev.ua/handle/123456789/214906 https://doi.org/10.15407/spqeo20.01.091 The process of cutting, mechanical and chemical treatment of the PbTe and Pb₁₋ₓSnₓTe crystal surface has been studied. The dependences of the chemical-mechanical polishing rate versus dilution of the base polishing etchant H₂O₂–HBr–ethylene glycol by the ethylene glycol have been determined. The surface states after chemical etching have been investigated using electron, metallographic, and atomic force microscopy, as well as X-ray microanalysis. It has been shown that the surface state is improved after chemical etching. Efficient methods for washing the samples after different types of PbTe and Pb₁₋ₓSnₓTe surface treatment (cutting the crystal, mechanical surface treatment, and chemical removal of the surface-damaged layer) have been developed. en Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України Semiconductor Physics Quantum Electronics & Optoelectronics The influence of ethylene glycol on the chemical interaction of PbTe and Pb₁₋ₓSnₓTe crystals with H₂O₂–HBr–ethylene glycol etching compositions Article published earlier |
| spellingShingle | The influence of ethylene glycol on the chemical interaction of PbTe and Pb₁₋ₓSnₓTe crystals with H₂O₂–HBr–ethylene glycol etching compositions Malanych, G.P. Tomashyk, V.M. Lytvyn, O.S. |
| title | The influence of ethylene glycol on the chemical interaction of PbTe and Pb₁₋ₓSnₓTe crystals with H₂O₂–HBr–ethylene glycol etching compositions |
| title_full | The influence of ethylene glycol on the chemical interaction of PbTe and Pb₁₋ₓSnₓTe crystals with H₂O₂–HBr–ethylene glycol etching compositions |
| title_fullStr | The influence of ethylene glycol on the chemical interaction of PbTe and Pb₁₋ₓSnₓTe crystals with H₂O₂–HBr–ethylene glycol etching compositions |
| title_full_unstemmed | The influence of ethylene glycol on the chemical interaction of PbTe and Pb₁₋ₓSnₓTe crystals with H₂O₂–HBr–ethylene glycol etching compositions |
| title_short | The influence of ethylene glycol on the chemical interaction of PbTe and Pb₁₋ₓSnₓTe crystals with H₂O₂–HBr–ethylene glycol etching compositions |
| title_sort | influence of ethylene glycol on the chemical interaction of pbte and pb₁₋ₓsnₓte crystals with h₂o₂–hbr–ethylene glycol etching compositions |
| url | https://nasplib.isofts.kiev.ua/handle/123456789/214906 |
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