Influence of X-ray irradiation on the optical absorption edge and refractive index dispersion in Cu₆PS₅I-based thin films deposited using magnetron sputtering
Cu₆PS₅I-based thin films were deposited using non-reactive radio-frequency magnetron sputtering. Structural studies of thin films were performed by scanning electron microscopy, and their chemical composition was determined using energy-dispersive X-ray spectroscopy. As-deposited thin films were irr...
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| Veröffentlicht in: | Semiconductor Physics Quantum Electronics & Optoelectronics |
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| Datum: | 2017 |
| Hauptverfasser: | , , , , , |
| Format: | Artikel |
| Sprache: | Englisch |
| Veröffentlicht: |
Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
2017
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| Online Zugang: | https://nasplib.isofts.kiev.ua/handle/123456789/214924 |
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| Назва журналу: | Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| Zitieren: | Influence of X-ray irradiation on the optical absorption edge and refractive index dispersion in Cu₆PS₅I-based thin films deposited using magnetron sputtering / I.P. Studenyak, M.M. Kutsyk, A.V. Bendak, V. Yu. Izai, P. Kus, M. Mikula // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2017. — Т. 20, № 2. — С. 246-249. — Бібліогр.: 12 назв. — англ. |