Influence of X-ray irradiation on the optical absorption edge and refractive index dispersion in Cu₆PS₅I-based thin films deposited using magnetron sputtering

• Published in: Semiconductor Physics Quantum Electronics & Optoelectronics
• Date: 2017
• Main Authors: Studenyak, I.P., Kutsyk, M.M., Bendak, A.V., Izai, V.Yu., Kus, P., Mikula, M.
• Format: Article
• Language: English
• Published: Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України 2017
• Online Access: https://nasplib.isofts.kiev.ua/handle/123456789/214924
• Journal Title: Digital Library of Periodicals of National Academy of Sciences of Ukraine
• Cite this: Influence of X-ray irradiation on the optical absorption edge and refractive index dispersion in Cu₆PS₅I-based thin films deposited using magnetron sputtering / I.P. Studenyak, M.M. Kutsyk, A.V. Bendak, V. Yu. Izai, P. Kus, M. Mikula // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2017. — Т. 20, № 2. — С. 246-249. — Бібліогр.: 12 назв. — англ.

Cu₆PS₅I-based thin films were deposited using non-reactive radio-frequency magnetron sputtering. Structural studies of thin films were performed by scanning electron microscopy, and their chemical composition was determined using energy-dispersive X-ray spectroscopy. As-deposited thin films were irr...