Be-ion-implanted p-n InSb diode for infrared applications. Modeling, fabrication, and characterization
Transport theory for modeling the electric characteristics of high-quality p-n diodes has been developed. This theory takes into account a non-uniform profile of p-doping, finite thickness of the quasi-neutral regions, and possible non-uniformity of the bulk recombination coefficient. The theory is...
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| Published in: | Semiconductor Physics Quantum Electronics & Optoelectronics |
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| Date: | 2018 |
| Main Authors: | , , , , , , |
| Format: | Article |
| Language: | English |
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Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
2018
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| Online Access: | https://nasplib.isofts.kiev.ua/handle/123456789/215283 |
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| Journal Title: | Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| Cite this: | Be-ion-implanted p-n InSb diode for infrared applications. Modeling, fabrication, and characterization / V.V. Korotyeyev, V.O. Kochelap, S.V. Sapon, B.M. Romaniuk, V.P. Melnik, O.V. Dubikovskyi, T.M. Sabov // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2018. — Т. 21, № 3. — С. 294-306. — Бібліогр.: 33 назв. — англ. |
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Digital Library of Periodicals of National Academy of Sciences of Ukraine| _version_ | 1862665483034034176 |
|---|---|
| author | Korotyeyev, V.V. Kochelap, V.O. Sapon, S.V. Romaniuk, B.M. Melnik, V.P. Dubikovskyi, O.V. Sabov, T.M. |
| author_facet | Korotyeyev, V.V. Kochelap, V.O. Sapon, S.V. Romaniuk, B.M. Melnik, V.P. Dubikovskyi, O.V. Sabov, T.M. |
| citation_txt | Be-ion-implanted p-n InSb diode for infrared applications. Modeling, fabrication, and characterization / V.V. Korotyeyev, V.O. Kochelap, S.V. Sapon, B.M. Romaniuk, V.P. Melnik, O.V. Dubikovskyi, T.M. Sabov // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2018. — Т. 21, № 3. — С. 294-306. — Бібліогр.: 33 назв. — англ. |
| collection | DSpace DC |
| container_title | Semiconductor Physics Quantum Electronics & Optoelectronics |
| description | Transport theory for modeling the electric characteristics of high-quality p-n diodes has been developed. This theory takes into account a non-uniform profile of p-doping, finite thickness of the quasi-neutral regions, and possible non-uniformity of the bulk recombination coefficient. The theory is based on related solutions of the Poisson equation, the drift-diffusion equation, and the continuity equation with a generation-recombination term taking into account the simple band-to-band generation/recombination model. We have ascertained that the non-uniform profile of p-doping can lead to the formation of p-n junctions with a specific two-slope form of the electrostatic barrier and two regions with high built-in electric fields. We have found that at strong p⁺-doping the band structure of the InSb p-n junction has a form that can facilitate the emergence of additional mechanisms of current flow due to the tunneling and avalanche effects at the reverse bias. Using the literary data of the electron and hole lifetimes in InSb at cryogenic temperatures, we have found that the coefficient of bulk recombination can have an essential spatial dependence and considerably increases in the space charge region of a p-n diode. The theory was applied to our analysis of p-n InSb diodes with p⁺-doping by using Be-ion implantation performed in ISP NASU. The theory predicts optimal conditions for the detection of infrared emission. The technological process of fabrication, processing, and testing has been described in detail. Theoretically, it has been found that for parameters of the fabricated diodes and at 77 K, the dark currents limited by diffusion and generation-recombination mechanisms should be less than 0.1 µA at the inverse bias of the order of 0.1 V. The measured diode’s I-V characteristics were expected to have strong asymmetry; however, dark currents are by one order larger than those predicted by theory. The latter can be associated with additional current mechanisms, namely: tunneling and avalanche effects.
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| first_indexed | 2026-03-21T14:48:50Z |
| format | Article |
| fulltext | |
| id | nasplib_isofts_kiev_ua-123456789-215283 |
| institution | Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| issn | 1560-8034 |
| language | English |
| last_indexed | 2026-04-16T21:50:31Z |
| publishDate | 2018 |
| publisher | Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України |
| record_format | dspace |
| spelling | Korotyeyev, V.V. Kochelap, V.O. Sapon, S.V. Romaniuk, B.M. Melnik, V.P. Dubikovskyi, O.V. Sabov, T.M. 2026-03-11T10:13:59Z 2018 Be-ion-implanted p-n InSb diode for infrared applications. Modeling, fabrication, and characterization / V.V. Korotyeyev, V.O. Kochelap, S.V. Sapon, B.M. Romaniuk, V.P. Melnik, O.V. Dubikovskyi, T.M. Sabov // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2018. — Т. 21, № 3. — С. 294-306. — Бібліогр.: 33 назв. — англ. 1560-8034 PACS: 61.72.uj, 85.30.Kk https://nasplib.isofts.kiev.ua/handle/123456789/215283 https://doi.org/10.15407/spqeo21.03.294 Transport theory for modeling the electric characteristics of high-quality p-n diodes has been developed. This theory takes into account a non-uniform profile of p-doping, finite thickness of the quasi-neutral regions, and possible non-uniformity of the bulk recombination coefficient. The theory is based on related solutions of the Poisson equation, the drift-diffusion equation, and the continuity equation with a generation-recombination term taking into account the simple band-to-band generation/recombination model. We have ascertained that the non-uniform profile of p-doping can lead to the formation of p-n junctions with a specific two-slope form of the electrostatic barrier and two regions with high built-in electric fields. We have found that at strong p⁺-doping the band structure of the InSb p-n junction has a form that can facilitate the emergence of additional mechanisms of current flow due to the tunneling and avalanche effects at the reverse bias. Using the literary data of the electron and hole lifetimes in InSb at cryogenic temperatures, we have found that the coefficient of bulk recombination can have an essential spatial dependence and considerably increases in the space charge region of a p-n diode. The theory was applied to our analysis of p-n InSb diodes with p⁺-doping by using Be-ion implantation performed in ISP NASU. The theory predicts optimal conditions for the detection of infrared emission. The technological process of fabrication, processing, and testing has been described in detail. Theoretically, it has been found that for parameters of the fabricated diodes and at 77 K, the dark currents limited by diffusion and generation-recombination mechanisms should be less than 0.1 µA at the inverse bias of the order of 0.1 V. The measured diode’s I-V characteristics were expected to have strong asymmetry; however, dark currents are by one order larger than those predicted by theory. The latter can be associated with additional current mechanisms, namely: tunneling and avalanche effects. This work is partially supported by the Ministry of Education and Science of Ukraine (Project M/24-2018) and German Federal Ministry of Education and Research (BMBF Project 01DK17028). en Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України Semiconductor Physics Quantum Electronics & Optoelectronics Optoelectronics and optoelectronic devices Be-ion-implanted p-n InSb diode for infrared applications. Modeling, fabrication, and characterization Article published earlier |
| spellingShingle | Be-ion-implanted p-n InSb diode for infrared applications. Modeling, fabrication, and characterization Korotyeyev, V.V. Kochelap, V.O. Sapon, S.V. Romaniuk, B.M. Melnik, V.P. Dubikovskyi, O.V. Sabov, T.M. Optoelectronics and optoelectronic devices |
| title | Be-ion-implanted p-n InSb diode for infrared applications. Modeling, fabrication, and characterization |
| title_full | Be-ion-implanted p-n InSb diode for infrared applications. Modeling, fabrication, and characterization |
| title_fullStr | Be-ion-implanted p-n InSb diode for infrared applications. Modeling, fabrication, and characterization |
| title_full_unstemmed | Be-ion-implanted p-n InSb diode for infrared applications. Modeling, fabrication, and characterization |
| title_short | Be-ion-implanted p-n InSb diode for infrared applications. Modeling, fabrication, and characterization |
| title_sort | be-ion-implanted p-n insb diode for infrared applications. modeling, fabrication, and characterization |
| topic | Optoelectronics and optoelectronic devices |
| topic_facet | Optoelectronics and optoelectronic devices |
| url | https://nasplib.isofts.kiev.ua/handle/123456789/215283 |
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