Influence of boron doping on the photosensitivity of cubic silicon carbide

Photoelectric properties have been studied for 3С-SiC single crystals obtained by thermal decomposition of methyl trichlorosilane with the addition of boron in the process of growing or using diffusion into intentionally undoped crystals. Boron-doped samples demonstrate the band of photosensitivity...

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Опубліковано в: :Semiconductor Physics Quantum Electronics & Optoelectronics
Дата:2019
Автори: Rodionov, V.N., Bratus', V.Ya., Voronov, S.O.
Формат: Стаття
Мова:Англійська
Опубліковано: Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України 2019
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Онлайн доступ:https://nasplib.isofts.kiev.ua/handle/123456789/215422
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Назва журналу:Digital Library of Periodicals of National Academy of Sciences of Ukraine
Цитувати:Influence of boron doping on the photosensitivity of cubic silicon carbide / V.N. Rodionov, V.Ya. Bratus', S.O. Voronov // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2019. — Т. 22, № 1. — С. 92-97. — Бібліогр.: 20 назв. — англ.

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Digital Library of Periodicals of National Academy of Sciences of Ukraine
_version_ 1862601848100225024
author Rodionov, V.N.
Bratus', V.Ya.
Voronov, S.O.
author_facet Rodionov, V.N.
Bratus', V.Ya.
Voronov, S.O.
citation_txt Influence of boron doping on the photosensitivity of cubic silicon carbide / V.N. Rodionov, V.Ya. Bratus', S.O. Voronov // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2019. — Т. 22, № 1. — С. 92-97. — Бібліогр.: 20 назв. — англ.
collection DSpace DC
container_title Semiconductor Physics Quantum Electronics & Optoelectronics
description Photoelectric properties have been studied for 3С-SiC single crystals obtained by thermal decomposition of methyl trichlorosilane with the addition of boron in the process of growing or using diffusion into intentionally undoped crystals. Boron-doped samples demonstrate the band of photosensitivity within the range 1.3…2.0 eV with the peak near 1.7 eV. Doping of 3С-SiC single crystals with B impurity leads to the appearance of an efficient recombination center with the thermal activation energy 0.27 ± 0.02 eV inside the band gap and to widening the spectral sensitivity of the material over the impurity long-wave range. Availability of boron results in changing the temperature dependence of photoconductivity from the decay characteristic to the activation one. It will allow expanding the operation range of devices based on 3C-SiC〈B〉 up to 500 °С and above it. In addition, the lux-ampere characteristics become linear, i.e., more convenient from the metrological viewpoint. Depending on the type of doping of 3C-SiC〈B〉 samples, pronounced variations of line positions in photoluminescence spectra in the near-infrared range are revealed.
first_indexed 2026-03-23T18:51:09Z
format Article
fulltext
id nasplib_isofts_kiev_ua-123456789-215422
institution Digital Library of Periodicals of National Academy of Sciences of Ukraine
issn 1560-8034
language English
last_indexed 2026-03-23T18:51:09Z
publishDate 2019
publisher Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
record_format dspace
spelling Rodionov, V.N.
Bratus', V.Ya.
Voronov, S.O.
2026-03-16T10:58:59Z
2019
Influence of boron doping on the photosensitivity of cubic silicon carbide / V.N. Rodionov, V.Ya. Bratus', S.O. Voronov // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2019. — Т. 22, № 1. — С. 92-97. — Бібліогр.: 20 назв. — англ.
1560-8034
PACS: 61.72.uf, 72.40.+w, 73.50.Pz, 78.55.Hx
https://nasplib.isofts.kiev.ua/handle/123456789/215422
https://doi.org/10.15407/spqeo22.01.92
Photoelectric properties have been studied for 3С-SiC single crystals obtained by thermal decomposition of methyl trichlorosilane with the addition of boron in the process of growing or using diffusion into intentionally undoped crystals. Boron-doped samples demonstrate the band of photosensitivity within the range 1.3…2.0 eV with the peak near 1.7 eV. Doping of 3С-SiC single crystals with B impurity leads to the appearance of an efficient recombination center with the thermal activation energy 0.27 ± 0.02 eV inside the band gap and to widening the spectral sensitivity of the material over the impurity long-wave range. Availability of boron results in changing the temperature dependence of photoconductivity from the decay characteristic to the activation one. It will allow expanding the operation range of devices based on 3C-SiC〈B〉 up to 500 °С and above it. In addition, the lux-ampere characteristics become linear, i.e., more convenient from the metrological viewpoint. Depending on the type of doping of 3C-SiC〈B〉 samples, pronounced variations of line positions in photoluminescence spectra in the near-infrared range are revealed.
The authors are grateful to Dr. O. Kolomys and Prof. V. Strelchuk for assistance in PL characterizations.
en
Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
Semiconductor Physics Quantum Electronics & Optoelectronics
Optoelectronics and optoelectronic devices
Influence of boron doping on the photosensitivity of cubic silicon carbide
Article
published earlier
spellingShingle Influence of boron doping on the photosensitivity of cubic silicon carbide
Rodionov, V.N.
Bratus', V.Ya.
Voronov, S.O.
Optoelectronics and optoelectronic devices
title Influence of boron doping on the photosensitivity of cubic silicon carbide
title_full Influence of boron doping on the photosensitivity of cubic silicon carbide
title_fullStr Influence of boron doping on the photosensitivity of cubic silicon carbide
title_full_unstemmed Influence of boron doping on the photosensitivity of cubic silicon carbide
title_short Influence of boron doping on the photosensitivity of cubic silicon carbide
title_sort influence of boron doping on the photosensitivity of cubic silicon carbide
topic Optoelectronics and optoelectronic devices
topic_facet Optoelectronics and optoelectronic devices
url https://nasplib.isofts.kiev.ua/handle/123456789/215422
work_keys_str_mv AT rodionovvn influenceofborondopingonthephotosensitivityofcubicsiliconcarbide
AT bratusvya influenceofborondopingonthephotosensitivityofcubicsiliconcarbide
AT voronovso influenceofborondopingonthephotosensitivityofcubicsiliconcarbide