Effect of electron-beam treatment of sensor glass substrates for SPR devices on their metrological characteristics

Electron-beam treatment of the glass substrates for sensitive elements of SPR devices causes almost two-fold narrowing of their refractometric characteristics from 0.867 down to 0.453 degrees. The angular shift was also changed, which made the measuring range wider by 0.37 deg. The sensitivity of SP...

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Published in:Semiconductor Physics Quantum Electronics & Optoelectronics
Date:2019
Main Authors: Vashchenko, V.A., Yatsenko, I.V., Kovalenko, Yu.I., Kladko, V.P., Gudymenko, O.Yo., Lytvyn, P.M., Korchovyi, A.A., Mamykin, S.V., Kondratenko, O.S., Maslov, V.P., Dorozinska, H.V., Dorozinsky, G.V.
Format: Article
Language:English
Published: Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України 2019
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Online Access:https://nasplib.isofts.kiev.ua/handle/123456789/215585
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Cite this:Effect of electron-beam treatment of sensor glass substrates for SPR devices on their metrological characteristics / V.A. Vashchenko, I.V. Yatsenko, Yu.I. Kovalenko, V.P. Kladko, O.Yo. Gudymenko, P.M. Lytvyn, A.A. Korchovyi, S.V. Mamykin, O.S. Kondratenko, V.P. Maslov, H.V. Dorozinska, G.V. Dorozinsky // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2019. — Т. 22, № 4. — С. 444-451. — Бібліогр.: 19 назв. — англ.

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Digital Library of Periodicals of National Academy of Sciences of Ukraine
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author Vashchenko, V.A.
Yatsenko, I.V.
Kovalenko, Yu.I.
Kladko, V.P.
Gudymenko, O.Yo.
Lytvyn, P.M.
Korchovyi, A.A.
Mamykin, S.V.
Kondratenko, O.S.
Maslov, V.P.
Dorozinska, H.V.
Dorozinsky, G.V.
author_facet Vashchenko, V.A.
Yatsenko, I.V.
Kovalenko, Yu.I.
Kladko, V.P.
Gudymenko, O.Yo.
Lytvyn, P.M.
Korchovyi, A.A.
Mamykin, S.V.
Kondratenko, O.S.
Maslov, V.P.
Dorozinska, H.V.
Dorozinsky, G.V.
citation_txt Effect of electron-beam treatment of sensor glass substrates for SPR devices on their metrological characteristics / V.A. Vashchenko, I.V. Yatsenko, Yu.I. Kovalenko, V.P. Kladko, O.Yo. Gudymenko, P.M. Lytvyn, A.A. Korchovyi, S.V. Mamykin, O.S. Kondratenko, V.P. Maslov, H.V. Dorozinska, G.V. Dorozinsky // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2019. — Т. 22, № 4. — С. 444-451. — Бібліогр.: 19 назв. — англ.
collection DSpace DC
container_title Semiconductor Physics Quantum Electronics & Optoelectronics
description Electron-beam treatment of the glass substrates for sensitive elements of SPR devices causes almost two-fold narrowing of their refractometric characteristics from 0.867 down to 0.453 degrees. The angular shift was also changed, which made the measuring range wider by 0.37 deg. The sensitivity of SPR devices increased by 1.7 times from 1.425 up to 2.396 deg⁻¹ as a consequence of lowering the energy expenses during propagation of surface plasmons along the boundary “metal–air”. The reason for this lowering is related to higher surface uniformity of the gold metal film, its higher density, as well as lower nanoroughness of the glass surface and the thickness of the heterointerface “gold–air”. In this case, the dispersion value for unevenness heights on the surface relatively to the baseline was lowered from ±18 down to ±5 nm, mean-square roughness was three-fold reduced from 4.67 down to 1.64 nm, and the thickness of the heterointerface gold–air was lowered from 3.26 down to 1.37 nm. It was ascertained using X-ray reflectometry that the film density increased from 17.2 to 19.3 g/cm³ and reached the value typical for the bulk gold. It provided the changes in the refraction index and extinction coefficient of the gold film, which was ascertained using the ellipsometric method. Thus, the performed analysis of refractometric characteristics showed that electron-beam treatment of the glass substrates of sensitive elements for SPR devices is able to efficiently enhance their sensitivity and to widen the range of measured resonance SPR angles.
first_indexed 2026-03-23T19:07:49Z
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last_indexed 2026-03-23T19:08:10Z
publishDate 2019
publisher Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
record_format dspace
spelling Vashchenko, V.A.
Yatsenko, I.V.
Kovalenko, Yu.I.
Kladko, V.P.
Gudymenko, O.Yo.
Lytvyn, P.M.
Korchovyi, A.A.
Mamykin, S.V.
Kondratenko, O.S.
Maslov, V.P.
Dorozinska, H.V.
Dorozinsky, G.V.
2026-03-20T08:42:34Z
2019
Effect of electron-beam treatment of sensor glass substrates for SPR devices on their metrological characteristics / V.A. Vashchenko, I.V. Yatsenko, Yu.I. Kovalenko, V.P. Kladko, O.Yo. Gudymenko, P.M. Lytvyn, A.A. Korchovyi, S.V. Mamykin, O.S. Kondratenko, V.P. Maslov, H.V. Dorozinska, G.V. Dorozinsky // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2019. — Т. 22, № 4. — С. 444-451. — Бібліогр.: 19 назв. — англ.
1560-8034
PACS: 73.20.Mr
https://nasplib.isofts.kiev.ua/handle/123456789/215585
https://doi.org/10.15407/spqeo22.04.444
Electron-beam treatment of the glass substrates for sensitive elements of SPR devices causes almost two-fold narrowing of their refractometric characteristics from 0.867 down to 0.453 degrees. The angular shift was also changed, which made the measuring range wider by 0.37 deg. The sensitivity of SPR devices increased by 1.7 times from 1.425 up to 2.396 deg⁻¹ as a consequence of lowering the energy expenses during propagation of surface plasmons along the boundary “metal–air”. The reason for this lowering is related to higher surface uniformity of the gold metal film, its higher density, as well as lower nanoroughness of the glass surface and the thickness of the heterointerface “gold–air”. In this case, the dispersion value for unevenness heights on the surface relatively to the baseline was lowered from ±18 down to ±5 nm, mean-square roughness was three-fold reduced from 4.67 down to 1.64 nm, and the thickness of the heterointerface gold–air was lowered from 3.26 down to 1.37 nm. It was ascertained using X-ray reflectometry that the film density increased from 17.2 to 19.3 g/cm³ and reached the value typical for the bulk gold. It provided the changes in the refraction index and extinction coefficient of the gold film, which was ascertained using the ellipsometric method. Thus, the performed analysis of refractometric characteristics showed that electron-beam treatment of the glass substrates of sensitive elements for SPR devices is able to efficiently enhance their sensitivity and to widen the range of measured resonance SPR angles.
en
Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
Semiconductor Physics Quantum Electronics & Optoelectronics
Optics
Effect of electron-beam treatment of sensor glass substrates for SPR devices on their metrological characteristics
Article
published earlier
spellingShingle Effect of electron-beam treatment of sensor glass substrates for SPR devices on their metrological characteristics
Vashchenko, V.A.
Yatsenko, I.V.
Kovalenko, Yu.I.
Kladko, V.P.
Gudymenko, O.Yo.
Lytvyn, P.M.
Korchovyi, A.A.
Mamykin, S.V.
Kondratenko, O.S.
Maslov, V.P.
Dorozinska, H.V.
Dorozinsky, G.V.
Optics
title Effect of electron-beam treatment of sensor glass substrates for SPR devices on their metrological characteristics
title_full Effect of electron-beam treatment of sensor glass substrates for SPR devices on their metrological characteristics
title_fullStr Effect of electron-beam treatment of sensor glass substrates for SPR devices on their metrological characteristics
title_full_unstemmed Effect of electron-beam treatment of sensor glass substrates for SPR devices on their metrological characteristics
title_short Effect of electron-beam treatment of sensor glass substrates for SPR devices on their metrological characteristics
title_sort effect of electron-beam treatment of sensor glass substrates for spr devices on their metrological characteristics
topic Optics
topic_facet Optics
url https://nasplib.isofts.kiev.ua/handle/123456789/215585
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