Effect of electron-beam treatment of sensor glass substrates for SPR devices on their metrological characteristics
Electron-beam treatment of the glass substrates for sensitive elements of SPR devices causes almost two-fold narrowing of their refractometric characteristics from 0.867 down to 0.453 degrees. The angular shift was also changed, which made the measuring range wider by 0.37 deg. The sensitivity of SP...
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| Published in: | Semiconductor Physics Quantum Electronics & Optoelectronics |
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| Date: | 2019 |
| Main Authors: | , , , , , , , , , , , |
| Format: | Article |
| Language: | English |
| Published: |
Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
2019
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| Subjects: | |
| Online Access: | https://nasplib.isofts.kiev.ua/handle/123456789/215585 |
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| Journal Title: | Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| Cite this: | Effect of electron-beam treatment of sensor glass substrates for SPR devices on their metrological characteristics / V.A. Vashchenko, I.V. Yatsenko, Yu.I. Kovalenko, V.P. Kladko, O.Yo. Gudymenko, P.M. Lytvyn, A.A. Korchovyi, S.V. Mamykin, O.S. Kondratenko, V.P. Maslov, H.V. Dorozinska, G.V. Dorozinsky // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2019. — Т. 22, № 4. — С. 444-451. — Бібліогр.: 19 назв. — англ. |
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