Influence of magnetic field strength on the focusing properties of a high-current plasma lens
We present results of experimental studies of the operation of the high-current wide-aperture plasma lens in the range of low magnetic fields. Investigations of focusing of copper and carbon ion beams with current up to 0,5 A and energy up to 20 keV by a plasma lens with aperture ~7 cm were conducte...
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| Veröffentlicht in: | Вопросы атомной науки и техники |
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| Datum: | 2000 |
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Національний науковий центр «Харківський фізико-технічний інститут» НАН України
2000
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| Zitieren: | Influence of magnetic field strength on the focusing properties of a high-current plasma lens / A.A. Goncharov, S.M. Gubarev, I.M. Protsenko, I. Brown // Вопросы атомной науки и техники. — 2000. — № 6. — С. 124-127. — Бібліогр.: 5 назв. — англ. |
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Goncharov, A.A. Gubarev, S.M. Protsenko, I.M. Brown, I. 2015-03-18T18:44:50Z 2015-03-18T18:44:50Z 2000 Influence of magnetic field strength on the focusing properties of a high-current plasma lens / A.A. Goncharov, S.M. Gubarev, I.M. Protsenko, I. Brown // Вопросы атомной науки и техники. — 2000. — № 6. — С. 124-127. — Бібліогр.: 5 назв. — англ. 1562-6016 https://nasplib.isofts.kiev.ua/handle/123456789/78545 533.9 We present results of experimental studies of the operation of the high-current wide-aperture plasma lens in the range of low magnetic fields. Investigations of focusing of copper and carbon ion beams with current up to 0,5 A and energy up to 20 keV by a plasma lens with aperture ~7 cm were conducted in Kiev; studies of focusing of tantalum, copper, zinc and carbon ion beams with current up to 0,5 A and energy up to 50 keV were studied in Berkeley. In both cases ion beams were produced by a vacuum-arc (MEVVA-type) ion source. Substantial increase of the beam current density at the focus of the lens was found for low magnitudes of the magnetic fields. A maximum in beam current density is observed for magnetic fields 5-16 kA/m, in a notably narrow range. The optimal magnetic field increases with increasing voltage applied to the lens. For a copper ion beam the optimal current density reaches ~250 mA/cm2, then drops by a factor 3-4 with increasing magnetic field, after which it grows again and reaches a saturation value ~120 mA/cm2 for magnetic fields exceeding 40 kA/m. The effect is observed for different distributions of the external potential of the lens electrodes. Measurement of the radial distribution of potential in the mid-plane of the lens reveals a self-consistent optimal electric field topography with minimal spherical aberrations. It is observed also in the optimum case, a drastic decrease (by a factor of more than an order of magnitude) in the amplitude of oscillations in the lens and focused ion beam. A decrease of the halfwidth of the ion beam at the lens focus is also observed. This work was supported by the Ministry of Science and Technology of Ukraine (project #2.4/705 and #2.5.2/10). en Національний науковий центр «Харківський фізико-технічний інститут» НАН України Вопросы атомной науки и техники Вeams and waves in plasma Influence of magnetic field strength on the focusing properties of a high-current plasma lens Article published earlier |
| institution |
Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| collection |
DSpace DC |
| title |
Influence of magnetic field strength on the focusing properties of a high-current plasma lens |
| spellingShingle |
Influence of magnetic field strength on the focusing properties of a high-current plasma lens Goncharov, A.A. Gubarev, S.M. Protsenko, I.M. Brown, I. Вeams and waves in plasma |
| title_short |
Influence of magnetic field strength on the focusing properties of a high-current plasma lens |
| title_full |
Influence of magnetic field strength on the focusing properties of a high-current plasma lens |
| title_fullStr |
Influence of magnetic field strength on the focusing properties of a high-current plasma lens |
| title_full_unstemmed |
Influence of magnetic field strength on the focusing properties of a high-current plasma lens |
| title_sort |
influence of magnetic field strength on the focusing properties of a high-current plasma lens |
| author |
Goncharov, A.A. Gubarev, S.M. Protsenko, I.M. Brown, I. |
| author_facet |
Goncharov, A.A. Gubarev, S.M. Protsenko, I.M. Brown, I. |
| topic |
Вeams and waves in plasma |
| topic_facet |
Вeams and waves in plasma |
| publishDate |
2000 |
| language |
English |
| container_title |
Вопросы атомной науки и техники |
| publisher |
Національний науковий центр «Харківський фізико-технічний інститут» НАН України |
| format |
Article |
| description |
We present results of experimental studies of the operation of the high-current wide-aperture plasma lens in the range of low magnetic fields. Investigations of focusing of copper and carbon ion beams with current up to 0,5 A and energy up to 20 keV by a plasma lens with aperture ~7 cm were conducted in Kiev; studies of focusing of tantalum, copper, zinc and carbon ion beams with current up to 0,5 A and energy up to 50 keV were studied in Berkeley. In both cases ion beams were produced by a vacuum-arc (MEVVA-type) ion source. Substantial increase of the beam current density at the focus of the lens was found for low magnitudes of the magnetic fields. A maximum in beam current density is observed for magnetic fields 5-16 kA/m, in a notably narrow range. The optimal magnetic field increases with increasing voltage applied to the lens. For a copper ion beam the optimal current density reaches ~250 mA/cm2, then drops by a factor 3-4 with increasing magnetic field, after which it grows again and reaches a saturation value ~120 mA/cm2 for magnetic fields exceeding 40 kA/m. The effect is observed for different distributions of the external potential of the lens electrodes. Measurement of the radial distribution of potential in the mid-plane of the lens reveals a self-consistent optimal electric field topography with minimal spherical aberrations. It is observed also in the optimum case, a drastic decrease (by a factor of more than an order of magnitude) in the amplitude of oscillations in the lens and focused ion beam. A decrease of the halfwidth of the ion beam at the lens focus is also observed.
|
| issn |
1562-6016 |
| url |
https://nasplib.isofts.kiev.ua/handle/123456789/78545 |
| citation_txt |
Influence of magnetic field strength on the focusing properties of a high-current plasma lens / A.A. Goncharov, S.M. Gubarev, I.M. Protsenko, I. Brown // Вопросы атомной науки и техники. — 2000. — № 6. — С. 124-127. — Бібліогр.: 5 назв. — англ. |
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| first_indexed |
2025-12-07T19:27:08Z |
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2025-12-07T19:27:08Z |
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