TiN coating etching from a surface of the instrument in beam-plasma system
The results of reactive ion-plasma etching of TiN coatings from a surface of the tool in a beam-plasma system are submitted. The researches were made on the industrial set-up of a type «the Plasma boiler» with a magnetic field of the plug configuration. The electron guns on the basis of magnetron di...
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| Zitieren: | TiN coating etching from a surface of the instrument in beam-plasma system / A.A. Bizyukov, A.Y. Kashaba, K.N. Sereda, V.V. Sleptsov, М. Danziger, S. Phiodorov // Вопросы атомной науки и техники. — 2000. — № 6. — С. 163-165. — Бібліогр.: 7 назв. — англ. |
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Digital Library of Periodicals of National Academy of Sciences of Ukraine| _version_ | 1860258048002490368 |
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| author | Bizyukov, A.A. Kashaba, A.Y. Sereda, K.N. Sleptsov, V.V. Danziger, М. Phiodorov, S. |
| author_facet | Bizyukov, A.A. Kashaba, A.Y. Sereda, K.N. Sleptsov, V.V. Danziger, М. Phiodorov, S. |
| citation_txt | TiN coating etching from a surface of the instrument in beam-plasma system / A.A. Bizyukov, A.Y. Kashaba, K.N. Sereda, V.V. Sleptsov, М. Danziger, S. Phiodorov // Вопросы атомной науки и техники. — 2000. — № 6. — С. 163-165. — Бібліогр.: 7 назв. — англ. |
| collection | DSpace DC |
| container_title | Вопросы атомной науки и техники |
| description | The results of reactive ion-plasma etching of TiN coatings from a surface of the tool in a beam-plasma system are submitted. The researches were made on the industrial set-up of a type «the Plasma boiler» with a magnetic field of the plug configuration. The electron guns on the basis of magnetron discharge injected from magnetic plug in a magnetic trap volume oncoming electron beams with a current density up to 2 A/cm², energy 350÷550eV. At pressure 1.10⁻³ ÷ 5.10⁻³ Torr in a magnetic trap the beam-plasma discharge was fired from which one crosswise magnetic fields an ion flow on items was extracted. As working gases the mixture Ar and CF₄ were used. The given beam-plasma system allowed selectively to remove from a surface of the tools TiN coating at speed of etching 1÷2 µm/h on the area of 12000cm².
|
| first_indexed | 2025-12-07T18:51:32Z |
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UDC 533.9
Problems of Atomic Science and Technology. 2000. № 6. Series: Plasma Physics (6). p. 163-165 163
TiN COATING ETCHING FROM A SURFACE OF THE INSTRUMENT IN
BEAM-PLASMA SYSTEM
A.A.Bizyukov, A.Y.Kashaba, K.N.Sereda, V.V.Sleptsov, М.Danziger, S.Phiodorov
Kharkov National University, Faculty of physics and technologies, 31 Kurchatov Ave.,
Kharkov, 61108, Ukraine. E-mail: bizyukov pht.univer.kharkov.ua
The results of reactive ion-plasma etching of TiN coatings from a surface of the tool in a beam-plasma system
are submitted. The researches were made on the industrial set-up of a type «the Plasma boiler» with a magnetic field
of the plug configuration. The electron guns on the basis of magnetron discharge injected from magnetic plug in a
magnetic trap volume oncoming electron beams with a current density up to 22 cmA , energy eV 550350÷ . At
pressure Torr 105101 33 −− ⋅÷⋅ in a magnetic trap the beam-plasma discharge was fired from which one crosswise
magnetic fields an ion flow on items was extracted. As working gases the mixture Ar and CF4 were used. The given
beam-plasma system allowed selectively to remove from a surface of the tools TiN coating at speed of etching
hmµ21÷ on the area of 2 12000cm .
Introduction
Now in an industry, engineering, the technologies
and medicine a TiN coating are widely used. It is condi-
tioned by well spent technology of obtaining of such
coatings and their unique properties [1, 2]. Such coat-
ings have high hardness and strength, that allows, in
particular, essentially to increase resource of activity of
the mechanical tools. However acutely there is a prob-
lem on removal from a surface of the waste coating rests
before its repeated deposition. The existing liquid-
chemical technology of removal of TiN coatings is char-
acterized by poor efficiency and ecological harmfulness.
The vacuum ion-plasma technologies have not such
demerits. In the present work the results of researches
on usage of a plasma-beam system for removal of TiN
coatings from a surface of the tool are submitted. Selec-
tion of plasma-beam discharge, as source of ions for
etching coatings, is caused by volume nature of dis-
charge that provides uniformity and purity of an ion
flow on a job surface, and feasibility side by side with
physical sputtering using of plasma-chemical effects.
Besides the plasma-beam discharge is characterized by
high concentration of plasma at low pressures with a
high degree of ionization and dissociation of working
substances [3-5]. In the present work the results of min-
ing of a beam-plasma system and technologies of reac-
tive ion-plasma etching of TiN coatings from a surface
of a cutting tool with high efficiency are submitted.
Experimental set-up
The researches were carried out on the industrial set-
up of a type «the Plasma boiler» with vacuum chamber
dimensions of mmmmmm 1300 1010 900 ×× . Inside the
chamber the rotated holder of treated tools was placed,
on which the negative potential, value up to
VU 650−= is fed. The holder with tools was in a lon-
gitudinal magnetic field of the plug configuration with a
plug ratio 1:5, retaining fast electrons being injected
along magnetic field lines from two inverse ends of the
set-up.
As electron sources the designed electron guns on
the basis of direct current magnetron discharge were
used. The design features of the set-up have allowed to
make electron sources with the changeable output aper-
ture, and with changeable cross-sectional area of gener-
ated electron beams. If necessary it was possible to re-
ceive a solid electron beam with diameter of mm 50 on
outlet of a source, or tubular electron beam with an ex-
ternal diameter of about mm 160 .
The scheme of electron sources is shown in a Fig. 1.
The sources consist of cylindrical chilled cathodes of
two diameters with spent inserts made from a non-
magnetic stainless steel (1, 2), end earthed anode (3)
and shield (4) under a floating potential, placed between
cathodes and anode of a source. Between sources and
working area of the set-up the screens (5) under a float-
ing potential, for an avoidance of ignition of spurious
discharge between a holder of tools and earthed anodes
of sources were placed.
Shield, end anode and screen had the apertures con-
forming to diameter of the working cathode. Sources
were supplied in parallel connection from one power
source having a dropping volt-ampere characteristic.
Between an anode and one of cathodes of a source the
voltage by value ( )VUdm 10000 −= was applied. Near
the surface of spent cathodes with the help of the exter-
nal solenoid the magnetic field of the arch configuration
by value ( )OeH 300200 ÷= was formed. With cham-
ber pressure Torrp 103105 34 −− ⋅÷⋅= in the field of
spent cathodes the magnetron discharge with parameters
( )VUd 460400 ÷= , ( ) AId 122 ÷= was ignited. The
wide range of operating pressures of sources was caused
by that inside sources in a burning area of magnetron
discharge pressure was higher than in the chamber and
was regulated with the help of gas (Ar) injection
through a source.
On center of sources the capability of the installation
of a massive electrode from a non-magnetic stainless
steel with an insert in the form of tantalum tube (6),
working in a regime of the hollow cathode was envi-
164
sioned. It allowed, if necessary, to receive narrow elec-
tron beam on an axis of the chamber.
Fig. 1. The scheme of an electron source: 1- the
spent cathode of a narrow-aperture source; 2- the spent
cathode of a wide-aperture source,; 3- end anode; 4-
shield under a floating potential; 5- screens under a
floating potential; 6- hollow cathode
The electrons of magnetron discharge plasma in a
source oscillating in an arch magnetic field at the ex-
pense of collisions fall on line of magnetic field, with-
drawing them through the output aperture in the cham-
ber.
The effective extraction and acceleration of elec-
trons from a source is promoted by a direction of a
magnetic field gradient, and also by difference of cross-
section of a plasma column because of difference of
diameters of the cathode and aperture of a source [6].
The current of electron beam from the sources
makes a large part of a discharge current. The current
density of electron beam from two sources in center of
working chamber on an axis of a system reached value
2 2 cmA at a value of total current of discharge in two
sources about of A 10 .
The design features of sources did not enable hit of
mist spray of the spent cathode in a volume of the
plasma boiler.
In Fig.2 the volt-ampere characteristic of a narrow-
aperture electron source, and also electron beam current,
and attitude of a beam current to a discharge current
vise versa discharge voltage in a source is shown at
chamber pressure Torrp 103 3−⋅= .
Fig.2.
In Fig.3 the current density of electron beam vise
versa a discharge current on different distances from an
axis of a system is shown at chamber pressure
Torrp 103 3−⋅= .
Fig.3.
In a volume of the plasma boiler the beam electrons
moving along lines of a retaining magnetic field of plug
configuration, made ionization of working gas. The
cross sectional dimensions of a zone of effective ioniza-
300 350 400 450 500 550
0
2
4
6
8
10
I t
I d
Discharge voltage in source, V
D
is
ch
ar
ge
c
ur
re
nt
in
so
ur
ce
(I
d
),
А
Tu
rg
et
c
ur
re
nt
(I
t )
, А
0,0
0,4
0,8
1,2
1,6
2,0
(I t ) / (I d )
(I t ) / (I d )
0 2 4 6 8 10 12
0,0
0,4
0,8
1,2
1,6
2,0
2,4
B
ea
m
c
ur
re
nt
d
en
si
ty
, А
/
cm
2
Discharge current in sources, А
R0
R2
R4
R6
R8
R10
R12
165
tion by electron beams were determined by diameter of
the operational output aperture of sources. In a case of
narrow-aperture sources (diameter of the output aperture
50 mm) diameter of a zone of ionization in center of the
chamber was about mm 260 , in case of wide-aperture
sources (diameter of the output aperture 160 mm) – it
was about 350 mm.
TiN coating etching
At supply on a holder with tools of a negative poten-
tial, in the chamber the glow discharge was fired. The
cathode of this discharge was the holder with tools, and
anode was column of beam-plasma discharge. The con-
structional parts of a holder were occluded by screens
under a floating potential. From discharge in the cham-
ber crosswise magnetic fields an ion flow accelerated in
a layer of a cathode voltage drop up to energy, conform-
ing to a bias to a holder was extracted on tools.
Fig. 4.
In Fig.4 the value of ion current on tools and bias
voltage on tools vise versa value of a magnetic field in a
plug is shown.
As working substance the mixture of argon (Ar) and
freon (CF4) was used. The percentage of a freon in a
mixture was from 1% up to 20%.
The selection of a freon as a component of a work-
ing mixture is conditioned by stability both titanium,
and titanium nitride to sputtering by ions of argon and
absence of selectivity of etching TiN in relation to a
stuff of the tool. The ions of a fluorine, which appear as
a result of dissociation and ionization, bombard a sur-
face of tools and provide formation of titanium fluoride,
which is sublimated under relatively low temperature
and rather easily sputtered by ions of argon [7].
At chamber pressure Torrp 103 3−⋅= , on a working
mixture consisting of 90% of argon and 10% of a freon
and at parameters of discharge in electron sources
VUAI dd 450 , 8 == , on tools it was possible to re-
ceive an ion flow with energy eVet 660=ε and current
up to AIet 5= . The speed of TiN coating etching was
about hmµ21÷ with selectivity of etching of TiN in
relation to a stuff of tools 5:1 for one duty cycle, in
which it was possible to treat up to kg 200 of tools, in
particular 12 bulky tools.
Conclusions
The designed beam-plasma system allowed selec-
tively to remove from a surface of the tool TiN coating
without damage of a cutting edge at speed of removal of
coating hmµ21÷ .
Acknowledgement
This work was supported in part by Science and Tech-
nology Center in Ukraine, project #1112.
References
1. N.A.Kushnir, A.S. USSR № 235523, 1966.
2. L.P.Sablev, N.P.Atamansky, V.N.Gorbunov,
J.I.Dolotov, V.N.Lutsenko, L.M.Lunev and
V.V.Usov, US Patent 3.793.179, 1971.
3. Ye.I.Lutsenko, N.D.Sereda, А.Ph.Tseluyko, Re-
sponse curves of independent plasma-beam dis-
charge, Ukr. Fiz. Z., v.33, 5, 730 (1988).
4. Ye.I.Lutsenko, N.D.Sereda, L.М.Kontsevoy, Dou-
ble electrical layers in direct discharge, Z. Teh.
Fiz, v. XLV, 789-796, (1975).
5. Ye.I.Lutsenko, N.D.Sereda, L.М.Kontsevoy, Re-
search of formation of layers of a bulk charge in
plasma, Plasma Physics, v.2, 1, 72 (1976).
6. A.A.Bizyukov, K.N.Sereda, N.D.Sereda,
B.N.Perevozchikov, and V.V.Sleptsov, Metal ion
source with evaporated anode, Experimental
Techniques, vol. 39, 6, 877 (1996).
7. VLSI Electronics Microstructure Science, V.8,
Plasma Processing for VLSI, ed. By
N.G.Einspruch and D.M.Brown, chapter 8, Aca-
demic Press, Inc., 1984.
30 60 90 120 150 180 210
630
640
650
660
670
680
690
700
Magnetic field in plug, Oe
Bi
as
v
ot
ag
e,
V
4
5
6
7
8
9
10
11
I
U
Current onto tools, А
Introduction
Experimental set-up
TiN coating etching
Conclusions
Acknowledgement
References
|
| id | nasplib_isofts_kiev_ua-123456789-78562 |
| institution | Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| issn | 1562-6016 |
| language | English |
| last_indexed | 2025-12-07T18:51:32Z |
| publishDate | 2000 |
| publisher | Національний науковий центр «Харківський фізико-технічний інститут» НАН України |
| record_format | dspace |
| spelling | Bizyukov, A.A. Kashaba, A.Y. Sereda, K.N. Sleptsov, V.V. Danziger, М. Phiodorov, S. 2015-03-18T19:24:36Z 2015-03-18T19:24:36Z 2000 TiN coating etching from a surface of the instrument in beam-plasma system / A.A. Bizyukov, A.Y. Kashaba, K.N. Sereda, V.V. Sleptsov, М. Danziger, S. Phiodorov // Вопросы атомной науки и техники. — 2000. — № 6. — С. 163-165. — Бібліогр.: 7 назв. — англ. 1562-6016 https://nasplib.isofts.kiev.ua/handle/123456789/78562 533.9 The results of reactive ion-plasma etching of TiN coatings from a surface of the tool in a beam-plasma system are submitted. The researches were made on the industrial set-up of a type «the Plasma boiler» with a magnetic field of the plug configuration. The electron guns on the basis of magnetron discharge injected from magnetic plug in a magnetic trap volume oncoming electron beams with a current density up to 2 A/cm², energy 350÷550eV. At pressure 1.10⁻³ ÷ 5.10⁻³ Torr in a magnetic trap the beam-plasma discharge was fired from which one crosswise magnetic fields an ion flow on items was extracted. As working gases the mixture Ar and CF₄ were used. The given beam-plasma system allowed selectively to remove from a surface of the tools TiN coating at speed of etching 1÷2 µm/h on the area of 12000cm². This work was supported in part by Science and Technology Center in Ukraine, project #1112. en Національний науковий центр «Харківський фізико-технічний інститут» НАН України Вопросы атомной науки и техники Low temperature plasma and plasma technologies TiN coating etching from a surface of the instrument in beam-plasma system Article published earlier |
| spellingShingle | TiN coating etching from a surface of the instrument in beam-plasma system Bizyukov, A.A. Kashaba, A.Y. Sereda, K.N. Sleptsov, V.V. Danziger, М. Phiodorov, S. Low temperature plasma and plasma technologies |
| title | TiN coating etching from a surface of the instrument in beam-plasma system |
| title_full | TiN coating etching from a surface of the instrument in beam-plasma system |
| title_fullStr | TiN coating etching from a surface of the instrument in beam-plasma system |
| title_full_unstemmed | TiN coating etching from a surface of the instrument in beam-plasma system |
| title_short | TiN coating etching from a surface of the instrument in beam-plasma system |
| title_sort | tin coating etching from a surface of the instrument in beam-plasma system |
| topic | Low temperature plasma and plasma technologies |
| topic_facet | Low temperature plasma and plasma technologies |
| url | https://nasplib.isofts.kiev.ua/handle/123456789/78562 |
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