The low energy ribbon ion beam source and transport system
The ribbon ion beam can be used in the commercial ion implanters in order to enlarge the beam current. The Bernas type ion source and periodical system of electrostatic lenses (electrostatic undulator) are proposed for high intensity ion implanter design. The ribbon ion source and transport system...
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| Published in: | Вопросы атомной науки и техники |
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| Date: | 2006 |
| Main Authors: | , , , |
| Format: | Article |
| Language: | English |
| Published: |
Національний науковий центр «Харківський фізико-технічний інститут» НАН України
2006
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| Subjects: | |
| Online Access: | https://nasplib.isofts.kiev.ua/handle/123456789/78872 |
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| Journal Title: | Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| Cite this: | The low energy ribbon ion beam source and transport system / E.S. Masunov, S.M. Polozov, T.V. Kulevoy, V.I. Pershin // Вопросы атомной науки и техники. — 2006. — № 2. — С. 123-125. — Бібліогр.: 5 назв. — англ. |