Large-area surface wave plasma source
A surface wave plasma source for the production of a large-diameter, high electron density and low electron temperature plasma at low pressure without using a magnetic field for plasma processing and thin film preparation are. The DC or RF voltage with the frequency of 13.56 MHz can supply the sourc...
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| Published in: | Вопросы атомной науки и техники |
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| Date: | 2002 |
| Main Authors: | , , , , , , |
| Format: | Article |
| Language: | English |
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Національний науковий центр «Харківський фізико-технічний інститут» НАН України
2002
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| Online Access: | https://nasplib.isofts.kiev.ua/handle/123456789/79286 |
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| Journal Title: | Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| Cite this: | Large-area surface wave plasma source / N.A. Azarenkov, A.A. Bizyukov, A.V. Gapon, A.Y. Kashaba, K.N. Sereda, A.Ph. Tseluyko, N.N. Yunakov // Вопросы атомной науки и техники. — 2002. — № 5. — С. 118-120. — Бібліогр.: 6 назв. — англ. |
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Digital Library of Periodicals of National Academy of Sciences of Ukraine| _version_ | 1862552594968215552 |
|---|---|
| author | Azarenkov, N.A. Bizyukov, A.A. Sereda, K.N. Tseluyko, A.Ph. Yunakov, N.N. Gapon, A.V. Kashaba, A.Y. |
| author_facet | Azarenkov, N.A. Bizyukov, A.A. Sereda, K.N. Tseluyko, A.Ph. Yunakov, N.N. Gapon, A.V. Kashaba, A.Y. |
| citation_txt | Large-area surface wave plasma source / N.A. Azarenkov, A.A. Bizyukov, A.V. Gapon, A.Y. Kashaba, K.N. Sereda, A.Ph. Tseluyko, N.N. Yunakov // Вопросы атомной науки и техники. — 2002. — № 5. — С. 118-120. — Бібліогр.: 6 назв. — англ. |
| collection | DSpace DC |
| container_title | Вопросы атомной науки и техники |
| description | A surface wave plasma source for the production of a large-diameter, high electron density and low electron temperature plasma at low pressure without using a magnetic field for plasma processing and thin film preparation are. The DC or RF voltage with the frequency of 13.56 MHz can supply the source. The pumping-out of the source is carried out through the insulated substrate holder. The plasma source operates in a working gas pressure range of 3∙10⁻² ÷ 10⁻⁴ Torr with changing the RF power in a range of 50÷1000 W during the discharge on surface waves with the mode 0 excited by a ring antenna. The plasma density has a homogeneous distribution over a diameter of 300 mm and varies in a range of 10⁸÷10¹⁰ cm⁻³ at electron temperature of 2÷7 eV depending on external parameters. An ion beam density in the presence of the RF bias applied to the substrate holder reached 0.1 mA/сm² with homogeneous distribution over the diameter of 300 mm. The total ion current to the substrate holder with a diameter of 467 mm reaches the value of 2 A with average ion energy of 200 eV. Numerical analysis of electric field distribution over the processing chamber in linear approach was made and compared to experimental results obtained.
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| first_indexed | 2025-11-25T21:07:14Z |
| format | Article |
| fulltext | |
| id | nasplib_isofts_kiev_ua-123456789-79286 |
| institution | Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| issn | 1562-6016 |
| language | English |
| last_indexed | 2025-11-25T21:07:14Z |
| publishDate | 2002 |
| publisher | Національний науковий центр «Харківський фізико-технічний інститут» НАН України |
| record_format | dspace |
| spelling | Azarenkov, N.A. Bizyukov, A.A. Sereda, K.N. Tseluyko, A.Ph. Yunakov, N.N. Gapon, A.V. Kashaba, A.Y. 2015-03-30T09:37:26Z 2015-03-30T09:37:26Z 2002 Large-area surface wave plasma source / N.A. Azarenkov, A.A. Bizyukov, A.V. Gapon, A.Y. Kashaba, K.N. Sereda, A.Ph. Tseluyko, N.N. Yunakov // Вопросы атомной науки и техники. — 2002. — № 5. — С. 118-120. — Бібліогр.: 6 назв. — англ. 1562-6016 PACS: 52.50.Dg https://nasplib.isofts.kiev.ua/handle/123456789/79286 A surface wave plasma source for the production of a large-diameter, high electron density and low electron temperature plasma at low pressure without using a magnetic field for plasma processing and thin film preparation are. The DC or RF voltage with the frequency of 13.56 MHz can supply the source. The pumping-out of the source is carried out through the insulated substrate holder. The plasma source operates in a working gas pressure range of 3∙10⁻² ÷ 10⁻⁴ Torr with changing the RF power in a range of 50÷1000 W during the discharge on surface waves with the mode 0 excited by a ring antenna. The plasma density has a homogeneous distribution over a diameter of 300 mm and varies in a range of 10⁸÷10¹⁰ cm⁻³ at electron temperature of 2÷7 eV depending on external parameters. An ion beam density in the presence of the RF bias applied to the substrate holder reached 0.1 mA/сm² with homogeneous distribution over the diameter of 300 mm. The total ion current to the substrate holder with a diameter of 467 mm reaches the value of 2 A with average ion energy of 200 eV. Numerical analysis of electric field distribution over the processing chamber in linear approach was made and compared to experimental results obtained. This work was supported by Scientific Technical Centre of Ukraine, Project #1112. en Національний науковий центр «Харківський фізико-технічний інститут» НАН України Вопросы атомной науки и техники Low temperature plasma and plasma technologies Large-area surface wave plasma source Article published earlier |
| spellingShingle | Large-area surface wave plasma source Azarenkov, N.A. Bizyukov, A.A. Sereda, K.N. Tseluyko, A.Ph. Yunakov, N.N. Gapon, A.V. Kashaba, A.Y. Low temperature plasma and plasma technologies |
| title | Large-area surface wave plasma source |
| title_full | Large-area surface wave plasma source |
| title_fullStr | Large-area surface wave plasma source |
| title_full_unstemmed | Large-area surface wave plasma source |
| title_short | Large-area surface wave plasma source |
| title_sort | large-area surface wave plasma source |
| topic | Low temperature plasma and plasma technologies |
| topic_facet | Low temperature plasma and plasma technologies |
| url | https://nasplib.isofts.kiev.ua/handle/123456789/79286 |
| work_keys_str_mv | AT azarenkovna largeareasurfacewaveplasmasource AT bizyukovaa largeareasurfacewaveplasmasource AT seredakn largeareasurfacewaveplasmasource AT tseluykoaph largeareasurfacewaveplasmasource AT yunakovnn largeareasurfacewaveplasmasource AT gaponav largeareasurfacewaveplasmasource AT kashabaay largeareasurfacewaveplasmasource |