Electron sources for plasma electronics and different technological application
There are the following advantages of applying electron guns with plasma cathodes in devices exciting microwave radiation: stability of their parameters, high density of current, relative insensitivity to ion bombardment and the possibility of operating over a wide range of pressure values of a plas...
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| Опубліковано в: : | Вопросы атомной науки и техники |
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| Дата: | 2002 |
| Автори: | , , , |
| Формат: | Стаття |
| Мова: | Англійська |
| Опубліковано: |
Національний науковий центр «Харківський фізико-технічний інститут» НАН України
2002
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| Теми: | |
| Онлайн доступ: | https://nasplib.isofts.kiev.ua/handle/123456789/80310 |
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| Назва журналу: | Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| Цитувати: | Electron sources for plasma electronics and different technological application / V.S. Antipov, I.A. Bez’yazyshny, I.V. Berezhnaya, E.A. Kornilov // Вопросы атомной науки и техники. — 2002. — № 4. — С. 155-157. — Бібліогр.: 4 назв. — англ. |
Репозитарії
Digital Library of Periodicals of National Academy of Sciences of Ukraine| _version_ | 1862666152757428224 |
|---|---|
| author | Antipov, V.S. Bez’yazyshny, I.A. Berezhnaya, I.V. Kornilov, E.A. |
| author_facet | Antipov, V.S. Bez’yazyshny, I.A. Berezhnaya, I.V. Kornilov, E.A. |
| citation_txt | Electron sources for plasma electronics and different technological application / V.S. Antipov, I.A. Bez’yazyshny, I.V. Berezhnaya, E.A. Kornilov // Вопросы атомной науки и техники. — 2002. — № 4. — С. 155-157. — Бібліогр.: 4 назв. — англ. |
| collection | DSpace DC |
| container_title | Вопросы атомной науки и техники |
| description | There are the following advantages of applying electron guns with plasma cathodes in devices exciting microwave radiation: stability of their parameters, high density of current, relative insensitivity to ion bombardment and the possibility of operating over a wide range of pressure values of a plasma-generating gas [1-5]. The given work aims at constructing the guns with the parameters necessary for the excitation of microwaves of high amplitudes in the slow-wave structures: the beam energy is 20-30 kV, the current is up to 5 A, and the pulse duration is 0,11÷1 ms. The principal problem arising during construction of heavy-current electron sources with plasma emitters consists in the following: it is necessary to provide such conditions of the gas volume, under which the discharge firing would be stable and the emissive plasma generation be effective, whereas a gas breakdown in the accelerating gap must be eliminated.
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| first_indexed | 2025-12-07T15:18:57Z |
| format | Article |
| fulltext | |
| id | nasplib_isofts_kiev_ua-123456789-80310 |
| institution | Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| issn | 1562-6016 |
| language | English |
| last_indexed | 2025-12-07T15:18:57Z |
| publishDate | 2002 |
| publisher | Національний науковий центр «Харківський фізико-технічний інститут» НАН України |
| record_format | dspace |
| spelling | Antipov, V.S. Bez’yazyshny, I.A. Berezhnaya, I.V. Kornilov, E.A. 2015-04-14T17:38:24Z 2015-04-14T17:38:24Z 2002 Electron sources for plasma electronics and different technological application / V.S. Antipov, I.A. Bez’yazyshny, I.V. Berezhnaya, E.A. Kornilov // Вопросы атомной науки и техники. — 2002. — № 4. — С. 155-157. — Бібліогр.: 4 назв. — англ. 1562-6016 PACS: 52.80.-s; 52.77.-j https://nasplib.isofts.kiev.ua/handle/123456789/80310 There are the following advantages of applying electron guns with plasma cathodes in devices exciting microwave radiation: stability of their parameters, high density of current, relative insensitivity to ion bombardment and the possibility of operating over a wide range of pressure values of a plasma-generating gas [1-5]. The given work aims at constructing the guns with the parameters necessary for the excitation of microwaves of high amplitudes in the slow-wave structures: the beam energy is 20-30 kV, the current is up to 5 A, and the pulse duration is 0,11÷1 ms. The principal problem arising during construction of heavy-current electron sources with plasma emitters consists in the following: it is necessary to provide such conditions of the gas volume, under which the discharge firing would be stable and the emissive plasma generation be effective, whereas a gas breakdown in the accelerating gap must be eliminated. en Національний науковий центр «Харківський фізико-технічний інститут» НАН України Вопросы атомной науки и техники Plasma electronics Electron sources for plasma electronics and different technological application Article published earlier |
| spellingShingle | Electron sources for plasma electronics and different technological application Antipov, V.S. Bez’yazyshny, I.A. Berezhnaya, I.V. Kornilov, E.A. Plasma electronics |
| title | Electron sources for plasma electronics and different technological application |
| title_full | Electron sources for plasma electronics and different technological application |
| title_fullStr | Electron sources for plasma electronics and different technological application |
| title_full_unstemmed | Electron sources for plasma electronics and different technological application |
| title_short | Electron sources for plasma electronics and different technological application |
| title_sort | electron sources for plasma electronics and different technological application |
| topic | Plasma electronics |
| topic_facet | Plasma electronics |
| url | https://nasplib.isofts.kiev.ua/handle/123456789/80310 |
| work_keys_str_mv | AT antipovvs electronsourcesforplasmaelectronicsanddifferenttechnologicalapplication AT bezyazyshnyia electronsourcesforplasmaelectronicsanddifferenttechnologicalapplication AT berezhnayaiv electronsourcesforplasmaelectronicsanddifferenttechnologicalapplication AT kornilovea electronsourcesforplasmaelectronicsanddifferenttechnologicalapplication |