Ion beam system for nanotrimming of functional microelectronics layers

• Published in: Вопросы атомной науки и техники
• Date: 2011
• Main Authors: Bizyukov, A.A., Bizyukov, I.A., Girka, O.I., Sereda, K.N., Sleptsov, V.V., Gutkin, M., Mishin, S.
• Format: Article
• Language: English
• Published: Національний науковий центр «Харківський фізико-технічний інститут» НАН України 2011
• Subjects: Низкотемпературная плазма и плазменные технологии
• Online Access: https://nasplib.isofts.kiev.ua/handle/123456789/90892
• Journal Title: Digital Library of Periodicals of National Academy of Sciences of Ukraine
• Cite this: Ion beam system for nanotrimming of functional microelectronics layers / A.A. Bizyukov, I.A. Bizyukov, O.I. Girka, K.N. Sereda, V.V. Sleptsov, M. Gutkin, S. Mishin // Вопросы атомной науки и техники. — 2011. — № 1. — С. 110-112. — Бібліогр.: 3 назв. — англ.

This paper concerns with investigation of the trimming process which uses ion beam etching for high-precision adjustment of the thickness of functional microelectronics layers. The layer deposited on the substrate is etched by scanning focused ion beam; its position and power is regulated accordin...